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Articles by author: Marc M. Heyns

• Stroboscopic Schlieren Study of Bubble Formation during Megasonic Agitation
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p185)
• Study of the Etching Mechanism of Heavily Doped Si in HF
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p41)
• Surface Characterization after Different Wet Chemical Cleans
  Published in: Ultra Clean Processing of Silicon Surfaces V (p67)
• Surface Preparation Techniques for High-k Deposition on Ge Substrates
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p31)
• The Effect of Ion Implantation on the Metal Contamination of Silicon Surfaces in Aqueous Solution
  Published in: Ultra Clean Processing of Silicon Surfaces V (p7)
• The Impact of Backside Particles on the Limits of Optical Lithography
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p129)
• The Impact of Fe and Cu Contamination in the 10¹² at/cm² Range on the Performance of Junction Diodes
  Published in: Gettering and Defect Engineering in Semiconductor Technology VI (p397)
• The Importance of Cavitation Hysteresis in Megasonic Cleaning
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p171)
• The Influence of the Angle of Incidence in Megasonic Cleaning
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p163)
• The Origins of Fluorine in Dry Ultrathin Silicon Oxides
  Published in: Ultra Clean Processing of Silicon Surfaces V (p153)
• The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces V (p211)
• Ultra-Thin Oxide Growth on Silicon Using Ozonated Solutions
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p81)
• Use of Surfactants for Improved Particle Performance of dHF-Based Cleaning Recipes
  Published in: Ultra Clean Processing of Silicon Surfaces V (p263)
• Vapor Phase Decomposition - Droplet Collection: Can we Improve the Collection Efficiency for Copper Contamination?
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p93)
• XPS Study of the Cleaning Efficiency by Ozone Processes of the Protective Films Formed by Reactive Ion Etching of Co and Ti Silicide
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p139)