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Articles by author: Matty Caymax

• A New HF Vapor Process for Native Oxide Removal, Suited for Cluster Applications
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p225)
• A Wet Etching Technique to Reveal Threading Dislocations in Thin Germanium Layers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p83)
• Characterization of the Post Dry Etch Cleaning of the Silicon Surface Prior to Silicon Epitaxial Growth
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p97)
• Defect-Free Si Thinning by In Situ HCI Vapour Etching
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p199)
• Electrical Evaluation of the Epi/Substrate Interface Quality after Different In-Situ and Ex-Situ Low-Temperature Pre-Epi Cleaning Methods
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p237)
• Irradiation Induced Lattice Defects in Si_1-xGe_x Epitaxial Devices
  Published in: Defects in Semiconductors 18 (p371)
• Lattice Defects in Si_1-xGe_x Devices by Proton Irradiation and their Effect on Device Performance
  Published in: Gettering and Defect Engineering in Semiconductor Technology VII (p239)
• Lattice Defects in Si_1-xGe_x Epitaxial Diodes Induced by 20-MeV Alpha Rays
  Published in: Defects in Semiconductors 19 (p121)
• Lattice Defects Induced in Si_1-xGe_x Diodes by 1-MeV Electron Irradiation and their Influence on Electrical Characteristics
  Published in: Gettering and Defect Engineering in Semiconductor Technology (p247)
• Low Temperature Pre-Epi Treatment: Critical Parameters to Control Interface Contamination
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p177)
• On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p19)
• Polysilicon Thin-Film Solar Cells: Influence of the Deposition Rate upon Enhanced Diffusion and on Cell Performance
  Published in: Polycrystalline Semiconductors VI (p269)
• Properties of p-n Diodes Made in Polysilicon Layers with Intermediate Grain Size
  Published in: Polycrystalline Semiconductors V (p577)
• Role of UV/Chlorine Exposure during Dry Surface Conditioning before Integrated Epi Deposition Process
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p233)
• Surface Preparation Techniques for High-k Deposition on Ge Substrates
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p31)