Authors: Nada Habka, Véronique Soulière, Jean Marie Bluet, Maher Soueidan, Gabriel Ferro, Bilal Nsouli
Abstract: We report an optical study of 3C-SiC layers grown on 6H-SiC substrates by VLS
mechanism using a Si-Ge melt. The photoluminescence and μ-Raman results show a clear and
significant incorporation of germanium in the layers from the melt. A photoluminescence emission
attributed to Ge related transitions is observed in the infrared region. μ-Raman spectra exhibit two
peaks related to the Ge-Ge and Si-Ge bonds. From the characteristics of these Raman peaks, it was
found that the amount of Ge incorporated inside the 3C layers increases with increasing Ge content
of the melt. This has been verified by Particle-Induced X-rays Emission (PIXE) measurements
which gave a Ge concentration varying from ~ 1x1019 to ~ 1x1020 at.cm-3. All these results suggest
that Ge incorporates in the VLS grown 3C layers by forming Si-Ge-(C) nanoclusters.
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Authors: Maher Soueidan, Olivier Kim-Hak, Gabriel Ferro, Nada Habka, Bilal Nsouli
Abstract: The growth kinetics of 3C-SiC heteroepitaxial layers on α-SiC substrates by Vapour-Liquid-Solid (VLS) mechanism in Ge-Si melts was investigated. Various parameters were studied such as temperature, melt composition, propane flux and substrate nature (polytype, polarity and misorientation). It was found that the growth rate increases with increasing temperature, propane flux, Si content of the melt and misorientation of the substrate. The calculated activation energy (from 4.7 to 6.6 kcal/mole depending on the substrate type) is very small suggesting that the limiting process is the diffusion of the dissolved carbon inside the melt. The carbon solubility inside the melt mainly affects the carbon dissolution kinetics from the gas phase. The results also suggest that surface effects are important through the layer polarity and crystalline quality.
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Authors: Hervé Peyre, Nada Habka, Véronique Soulière, Maher Soueidan, Gabriel Ferro, Yves Monteil, Jean Camassel
Abstract: We report the results of a SIMS and micro-Raman investigation performed on cubic (3C)
SiC crystals grown on hexagonal SiC seeds using a Ge-Si bath and the so-called Vapor Liquid Solid
growth technique. From SIMS measurements, we find a Ge concentration which, roughly, scales
like the Ge concentration in the melt and, in term of micro-Raman measurements, explains the
presence of weak but discernable Ge-Ge peaks around 300 cm-1. Since no similar Si-Si vibrations
are found, this discard the possibility of having at the same time both Ge and Si constitutional
super-cooling with two separate Ge and Si phases.
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Authors: Nada Habka, Véronique Soulière, Jean Marie Bluet, Maher Soueidan, Gabriel Ferro, Yves Monteil
Abstract: We report an optical investigation of cubic Silicon Carbide (3C-SiC) layers grown on
6H-SiC substrates by Chemical Vapour Deposition and Vapour-Liquid-Solid mechanism. Micro-
Infrared reflectance ('-IR), micro-Raman ('-Raman) and low temperature photoluminescence
spectroscopies were used for the characterisation of such layers. '-IR measurements showed
unusual optical behaviour of 3C-SiC layers. The difference of refraction index between the 3C-SiC
film and the 6H-SiC substrate cannot explain this result. The experimental '-IR reflectance
spectrum was modelled by introducing a thin (thickness ≤ 0.5 'm) metallic-like (doping ≥ 1020
at.cm-3) interfacial film between the layer and the substrate. The photoluminescence spectra
revealed the presence of a peak which may be attributed to recombination at the 3C/6H interface.
All these results suggest the presence of a two dimensional electron gas at the interface.
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Authors: Maher Soueidan, Gabriel Ferro, Bilal Nsouli, Nada Habka, Véronique Soulière, Ghassan Younes, Khaled Zahraman, Jean Marie Bluet, Yves Monteil
Abstract: Vapor-Liquid-Solid was used for growing boron doped homoepitaxial SiC layers on 4HSiC(
0001) 8°off substrates. Si-based melts were fed by propane (5 sccm) in the temperature range
1450-1500°C. Two main approaches were studied to incorporate boron during growth : 1) adding
elemental B in the initial melt, with two different compositions : Si90B10 and Si27Ge68B5; the growth
was performed at 1500°C; 2) adding B2H6 (1 to 5 sccm) to the gas phase during growth with a melt
composition of Si25Ge75; the growth was performed at 1450°C. In most cases, the growth time was
limited by liquid loss due to wetting on the crucible walls. The longer growth duration (1h) was
obtained when adding B2H6 to the gas phase. In the case of Si90B10 melt, the surface morphology
exhibits large and parallel terraces whereas the step front is more undulated when adding Ge.
Raman and photoluminescence characterizations performed on these layers confirmed the 4H
polytype of the layers in addition to the presence of B which results in a strong B-N donor-acceptor
band. Particle induced γ-ray emission was also used to detect B incorporation inside the grown
layers.
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