Papers by Author: Song Zhang

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Abstract: Polycrystalline ڂ˽SiC thick film with mm-scaled thickness was deposited on a graphite substrate using a gaseous mixture of SiCl4 + CH4 and H2 at temperatures ranging from 1573 to 1823 K by chemical vapor deposition. Effect of deposition temperature (Tdep) on deposition rate, surface morphology and preferred orientation has been studied. The preferred orientation changed from <111> to <110> with increasing Tdep. The maximum deposition rate (Rdep) of 1125 ڌ̽˰̸1 has been obtained. The surface morphology has changed from six-fold pyramid to five-fold facet with increasing Tdep.
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Abstract: Thick (over 1 mm) β-SiC films were deposited at a deposition temperature of 1823 K and a total pressure of 4 kPa by halide CVD using SiCl4 and CH4 as precursors, and H2 as carrier gas. The maximum deposition rate was 1125 μm h−1. The SiC films showed strong (220) preferred orientation. The grain size increased from 20 to 100 μm with increasing C/Si ratio.
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Abstract: A group of boron-carbon ceramic material was in-situ synthesized and densified simultaneously via Spark Plasma Sintering (SPS) technique from carbon and boron element powders with different molar ratio. The phase structures of samples with different B/C molar ratio were characterized by X-ray Diffraction (XRD). The B/C atomic ratio of the sintered materials was calculated from X-ray photoelectron spectroscopy (XPS) measurement data. Meanwhile, the chemical analysis (CA) method had also been taken to verify the B/C atomic ratio. Finally, the experience equation had been obtained to control the B/C atomic ratio of sintered samples.
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