Papers by Author: Tsunenobu Kimoto

Abstract: We focused on the inability of the common high-low method to detect very fast interface states, and developed methods to evaluate such states (Cψ_S method). We have investigated correlation between the interface state density (D_IT) evaluated by the Cψ_S method and MOSFET performance, and found that the D_IT(Cψ_S) was well reflected in MOSFET performance. Very fast interface states which are generated by nitridation restricted the improvement of subthreshold slope and field-effect mobility.

Abstract: Ultrahigh-voltage SiC PiN diodes with an original junction termination extension (JTE) structure and improved forward characteristics are presented. A space-modulated JTE (SM-JTE) structure was designed by device simulation, and a high breakdown voltage of 26.9 kV was achieved by using a 270 μm-thick epilayer and 1050 μm-long JTE. In addition, lifetime enhancement process via thermal oxidation was performed to improve the forward characteristics. The on-resistance of the SiC PiN diodes was remarkably reduced by lifetime enhancement process. The temperature dependence of the on-resistance was also discussed.

Abstract: A total of nine electrically active levels have been detected in as-grown and electron irradiated p-type 4H-SiC epilayers. These traps are found in the 0.32-2.26 eV energy range, above the valence band edge (E_V). Of these, six are majority carrier traps whereas three are minority carrier traps. We found that thermal oxidation affects the concentrations of two midgap levels, the majority carrier trap, labeled HK4 and the minority carrier trap identified as EH_6/7. The analysis of the irradiation energy and dose dependence of the concentration of these two traps, rules out the possibility that they may share the same origin.

Abstract: In freestanding n-type 4H-SiC epilayers irradiated with low-energy (250 keV) electrons at room temperature, the electron paramagnetic resonance (EPR) spectrum of the negative carbon vacancy at the hexagonal site, VC- (h), and a new signal were observed. From the similarity in defect formation and the spin-Hamiltonian parameters of the two defects, the new center is suggested to be the negative C vacancy at the quasi-cubic site, VC- (k). The identification is further supported by hyperfine calculations.

Abstract: Ultra-pure n-type (8×10¹³ cm^-3), 99 μm thick epitaxial films of 4H SiC were electron irradiated at 170 keV with a fluence of 5×10¹⁶ cm^-2 or at 1 MeV with a fluence of 1×10¹⁵ cm^-2 in various geometries. Low temperature photoluminescence (LTPL) spectra and microwave photoconductance (μPCD) lifetime measurements were obtained on all samples prior to annealing and after annealing in Argon in free standing mode or on a POCO carbon platform, every 50°C from 1100°C to 1500°C. No improvement in carrier lifetime was obtained. Spurious lines attributable to the use of a Genesis CX 3550Å laser are also reported.

Abstract: Constant-capacitance deep-level transient spectroscopy was carried out to characterize in detail interface states close to the conduction band edge in SiO₂/SiC structures. The measured results are summarized as follows: (1) The capture of electrons by the interface states proceeds logarithmically with time. (2) The emission of electrons accelerates slightly with increasing density of captured electrons. The oxide trap model explains the logarithmic change in capture with time but not the phenomenon of accelerated emissions. This prompted us to formulate a new model that replicates the logarithmic capture process with time. In this model, we postulated the electron density at the interface decreases exponentially as the trapped electron density increases owing to the interaction between the trapped electrons and the free electrons. In this case, the capture process is almost the same as with the oxide trap model except for the definition of parameters. Further, we do not need to take into account the delay of the emission process caused by tunneling. The phenomenon of accelerated emissions may be explained by interactions among captured electrons in this model.

Abstract: Deep Level Transient Spectroscopy (DLTS) investigations at different temperatures and with various filling pulse lengths were performed on n-type 4H-SiC epitaxial layers using Iridium Schottky contacts to determine the electrical capture process of the EH₆-center. The temperature dependence of the electrical capture cross section σ ~ T^-2.0 suggests a cascade capture process, which is not thermally activated. Together with earlier work by Zippelius et al. [4] this proves the acceptor-type of the EH₆-center.

Abstract: We investigated the photoconductivity decay characteristics of p-type 4H-SiC bulk crystals grown by a modified Lely method by differential microwave photoconductance decay (μ-PCD) measurements using a 349-nm laser as an excitation source. We observed persistent photoconductivity (PPC) in the p-type SiC bulk crystals. The decay time at room temperature was 2600 μs. The decay time decreased with increasing temperature, resulting in 120 μs at 250oC, and the activation energy of the decay times was determined to be 140±10 meV. Long decay characteristics were also observed by below-band-gap excitation at 523 or 1047 nm. On the other hand, no PPC was observed in p-type homoepitaxial layers grown by hot-wall chemical vapor deposition.

Abstract: In this paper the impact of high temperature annealing on the formation of intrinsic defects in 4H-SiC such as Z_1/2 and EH_6/7 was examined. Therefore, three epitaxial layers with various initial concentrations of the Z_1/2- and EH_6/7-centers (10¹¹ – 10¹³ cm^-3) were investigated. It turns out that depending on the initial defect concentration the high temperature annealing leads to a monotone increase of the Z_1/2- and EH_6/7-concentration in a temperature range from 1600 to 1750°C. For a defined temperature above these values, the resulting defect concentration is independent of the sample’s initial values. Beside the growth conditions themselves such as C/Si ratio the thermal post-growth processing has a severe impact on the carrier lifetime which must be taken into account during device fabrication.

Abstract: An annealing study, in the 100-1400 C temperature range ,was carried out on Cl-implanted n- or p-type 4H-SiC epilayers. The electrical characterization of the epilayers shows the rise of several deep levels and the role of Cl, on both carrier concentration and defects' microscopic structure, is discussed in the light of theoretical results obtained by density functional calculations performed on a 64-atom cubic SiC supercell.