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Articles by keyword: «Annealing Temperature»

• Analysis of High Leakage Currents in 4H-SiC Schottky Barrier Diodes Using Optical Beam-Induced Current Measurements
  Published in: Silicon Carbide and Related Materials 2001 (p1141)
• Annealing Temperature Effect on the Microstructure and Adhesion of SiC Films Produced by MF Magnetron Sputtering
  Published in: Applications of Engineering Materials (p2423)
• Deformation and Recrystallization Textures in Al-SiC Metal-Matrix Composites
  Published in: Textures of Materials - ICOTOM 10 (p919)
• Dielectric Properties of Pb_0.97La_0.02Zr_0.95Ti_0.05O₃ Antiferroelectric Thin Films Prepared at Different Annealing Temperatures
  Published in: Applications of Engineering Materials (p2460)
• Effect of Annealing Temperature on Deformed Microstructure of Low Carbon Martensite
  Published in: Advanced Materials Research (p143)
• Effect of Annealing Temperature on Phosphorus Segregation at Grain Boundary in a Ti-IF Steel
  Published in: Frontiers of Advanced Materials and Engineering Technology (p724)
• Effect of Annealing Temperature on Properties of ZnO Thin Films
  Published in: Advances in Composites (p1796)
• Effect of Annealing Temperature on Recrystallisation in Al (AA1200) Cold Rolled to a True Strain of 4
  Published in: Recrystallization and Grain Growth III (p395)
• Effect of Annealing Temperatures on Formation of Na_0.5Bi_0.5TiO₃ and (Na_0.5Bi_0.5)_0.96Ba_0.04TiO₃ Ceramics Prepared via Sol Gel Method
  Published in: Solid State Science and Technology XXVI (p76)
• Effect of Annealing Temperatures on Nanostructure of NBT Ceramics Prepared via Sol Gel Method
  Published in: Nanomaterials (p412)
• Effect of Annealing Temperatures on the Microstructure of CuInS₂ Thin Film by One-Step Electrodeposition
  Published in: Advances in Composites (p530)
• Effect of Film Thickness and Annealing Temperature in Stress-Induced Damage in Metal Films
  Published in: THERMEC 2006 (p3520)
• Effect of Post Deposition Annealing Temperature on the Optoelectrical Property of ITO Thin Films Prepared by Magnetron Sputter Type Negative Metal Ion Source
  Published in: Heat Treatment of Materials (p287)
• Effect of the Annealing Temperature on Dielectric Properties of Bi_1.5Zn_1.0Nb_1.5O₇ Films Prepared by MOCVD
  Published in: Electroceramics in Japan XI (p175)
• Effect of Vacuum Annealing Temperature on Properties of Ga-Doped ZnO Films Deposited by DC Magnetron Reactive Sputtering
  Published in: Advanced Research on Material Engineering and its Application (p348)