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CONFERENCE
6/16/2013 - 6/19/2013
The 7th International conference on Physical and Numerical Simulation of Materials Processing
5/16/2013 - 5/19/2013
2nd International Congress on Advanced Materials
4/13/2013 - 4/14/2013
2013 2nd lnternational Conference on lntclligent Materials, Applied Mechanics and Design Science (IMAMD 2013)
more...
Articles by keyword: «
Atomic Layer Deposition
»
12 papers on 1 page:
1
ALD Deposited Al
2
O
3
Films on 6H-SiC(0001) after Annealing in Hydrogen Atmosphere
Published in:
Silicon Carbide and Related Materials 2004
(p559)
Atomic Layer Deposition of Thin Inorganic Coatings onto Renewable Packaging Materials
Published in:
Advanced Structural and Functional Materials for Protection
(p12)
Atomic Layer Deposition of ZnO Films and Their Application to Solar Cells
Published in:
Polycrystalline Semiconductors V
(p237)
Characteristics of ZnO Thin Film by Atomic Layer Deposition for Film Bulk Acoustic Resonator
Published in:
Designing, Processing and Properties of Advanced Engineering Materials
(p977)
Characterization of Aluminium and Titanium Oxides Deposited on 4H-SiC by Atomic Layer Deposition Technique
Published in:
Silicon Carbide and Related Materials 2004
(p701)
High-k Gate Dielectrics on Silicon and Germanium: Impact of Surface Preparation
Published in:
Ultra Clean Processing of Silicon Surfaces VII
(p3)
In Vitro Bioactivity of Atomic Layer Deposited Titanium Dioxide on Titanium and Silicon Substrates
Published in:
Bioceramics 20
(p689)
Kinetics Study of Aluminum Deposition on Inner Wall of Pipes by Atomic Layer Deposition
Published in:
Advanced Composite Materials
(p627)
Preparation on ZnO film by Atomic Layer Deposition
Published in:
Electroceramics in Japan II
(p159)
Strucutural Color Bio-Engineering by Replicating
Morpho
Wings
Published in:
Chemical Engineering and Material Properties
(p409)
Study on Al
2
O
3
Film in Anhydrous HF Vapor
Published in:
Ultra Clean Processing of Semiconductor Surfaces X
(p45)
Surface Passivation for Si Solar Cells: A Combination of Advanced Surface Cleaning and Thermal Atomic Layer Deposition of Al
2
O
3
Published in:
Ultra Clean Processing of Semiconductor Surfaces X
(p357)
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