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Articles by keyword: «BEOL»

• Effect of Pressure Pulsation on Post-Etch Photoresist Stripping on Low-k Films in Supercritical CO₂
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p341)
• Impact of Downstream Ash Plasmas on Ultra Low-k Materials
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p337)
• Influence of Photoresist and BARC Selection on the Efficiency of a Post-Etch Wet Strip in BEOL Applications
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p219)
• Modification of Photoresist by UV for Post-Etch Wet Strip Applications
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p323)
• Modification of Post-Etch Residues by UV for Wet Removal
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p207)
• New Dry Tool after Cleaning of Low-k Dielectrics
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p287)
• Photoresist Characterization and Wet Strip after Low-k Dry Etch
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p325)
• Porous Low-k Wet Etch in HF-Based Solutions: Focus on Cleaning Process Window, "Pore-Sealing" and "k Recovery"
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p295)
• Wet Clean Induce Pattern Collapse Mechanism Study
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p253)