| Paper Title | Page |
|---|---|
|
Creep Strain Behavior in Transient Region and Minimum Creep Rate of Tempered Martensitic 9%Cr Steel | Authors: Fujio Abe |
47 |
|
Authors: Guo Sheng Sun, Yong Mei Zhao, Liang Wang, Lei Wang, Wan Shun Zhao, Xing Fang Liu, Gang Ji, Yi Ping Zeng |
147 |
|
Authors: M. Ahmadian, M. Reid, Rian Dippenaar, Tara Chandra, David Wexler, Andrzej Calka |
921 |
|
6H-SiC Crystallinity Behaviour upon B Implantation Studied by Raman Scattering Authors: T. Paskova, E. Valcheva, Ivan G. Ivanov, Rositza Yakimova, Susan Savage, Nils Nordell, Chris I. Harris |
741 |
|
A Comparison of Transient Boron Diffusion in Silicon, Silicon Carbide and Diamond Authors: Margareta K. Linnarsson, J. Isberg, Adolf Schöner, Anders Hallén |
453 |
|
A Shallow Acceptor Complex in 4H-SiC: AlSiNCAlSi Authors: Peter Deák, B. Aradi, Adam Gali, Uwe Gerstmann, Wolfgang J. Choyke |
523 |
|
Authors: M. Bockstedte, Oleg Pankratov |
949 |
|
Ab-Initio Study of Dopant Interstitials in 4H-SiC Authors: Alexander Mattausch, M. Bockstedte, Oleg Pankratov |
523 |
|
Atom Redistribution during co-Doped Amorphous Silicon Crystallization Authors: Alain Portavoce, Dominique Mangelinck, Roberto Simola, Rachid Daineche, Jean Bernardini |
329 |
|
Authors: D. Blavette, L. Letellier, P. Duval, M. Guttmann |
79 |