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Keyword: "CMP"

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Paper Title	Page
Mechanism and Experimental Investigation on Silicon Wafer Hybrid Polishing by Ultrasonic-Elliptic-Vibration Chemical-Mechanical Authors: Wei Ping Yang, Yong Bo Wu, Hong Fei Yang	829
Mechanochemical Synthesis of Nano-Sized CeO₂ and its Application for CMP Slurry Authors: Geon Ja Lim, Jong Ho Lee, Joo Sun Kim, Hai Won Lee, Sang Hoon Hyun	1105
Modeling of Polishing Pad Wear in Chemical Mechanical Polishing Authors: Mao Li, Yong Wei Zhu, Jun Li, Kui Lin	318
Mosaic Diamond Disks with Brazed Pallets for CMP Authors: Ying Tung Chen, Chen Chin Yu, Cheng Shiang Chou, Chih Chung Chou, Yang Liang Pai, Zong Qing Yang, Mu Han Cheng, Tien Chen Hu, Michael Sung, James C. Sung	332
Pad Effects on Slurry Flows in CMP System Authors: Chao Hui Zhang, Jian Qun Zhang	1222
Polishing and Surface Characterization of SiC Substrates Authors: W.J. Everson, David Snyder, V.D. Heydemann	837
Polishing of Free-Standing CVD Diamond Films by the Combination of EDM and CMP Authors: Ze Wei Yuan, Zhu Ji Jin, B.X. Dong, Ren Ke Kang	111
Post CMP Cleaning Using a Novel HF Compatible High Power Magasonic Tank Authors: F. Tardif, T. Lardin, I. Constant, M. Fayolle, Pieter Boelen, C. Cowache, Ismail Kashkoush, R. Novak	169
Post Copper CMP: a Two Steps Cleaning Recipe Authors: Alessio Beverina, J.M. Fabbri, Didier Lévy, F. Tardif, Pascal Besson	299
Preliminary Radiological In Vivo Study of Calcium Metaphosphate Coated Ti-Alloy Implants Authors: S.W. Kim, S. Oh, Chang Kuk You, Myun Whan Ahn, K.H. Kim, Inn Kyu Kang, Jong Heun Lee, Suk Young Kim	881

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