Papers by Keyword: Cleaning

Abstract: The study aims to evaluate the effect of silver and gold nanoparticles during the laser cleaning process of glass artifacts. It is the first time that nanoparticles have been used to clean antique glass, as far as the authors are aware. In the context of this study, work was done on glass samples extracted from excavations that suffer from dense layers of corrosion products, soil deposits, brittle, easy to break, and cannot bear pressure. To characterize the investigated glass shards and assess the cleaning procedure, a variety of analytical techniques, including the transmission electron microscope (TEM), digital microscope, stereomicroscope, scanning electron microscope (SEM-EDX), X-ray diffraction (XRD), and color change measurement, have been used. The XRD analysis revealed different minerals such as ferrosilite, hillebrandite, and jacobsite, in the black corrosion layer, and calcite, syngenite, and arcanite in the white crust layer. The results of the microscopic examination employed in the evaluation procedure demonstrated that using Ag NPs with laser perfectly removed the tough crust layers without scratching the surface. The cleaned surface became smooth, homogenous and more transparent. The elemental analysis results by (SEM-EDX) revealed a significant reduction in the proportion elements of the (Al, Fe, p, and Mg) in the corrosion layer and their loss in the cleaned areas. Measurement of color change indicated that laser-treated glass samples with the addition of Ag NPs gave higher (ΔE*), confirming the influential role of this method in cleaning archaeological glass. It was also observed that the effect of Ag NPs with Laser assistance decreases the required time for the cleaning process. Thus the heat generated by the laser-treated was reduced, so the laser-treated with Ag NPs is recommended for use in the archaeological glass cleaning process.

Abstract: This presentation focuses on semiconductor wafer cleaning technology, one of the most critical technologies in semiconductor device manufacturing for obtaining high yield and reliability, and discusses the past, present, and future of the technology. Emphasis is placed on the review of contamination control and cleaning technologies in the early days since the invention of the transistor. To celebrate the 30+1-year anniversary of the UCPSS, a review will be given of both the first conference held in Leuven in 1992 and the second one held in Bruges in 1994. There will be more research challenges and business opportunities in environmentally benign, innovative damage-free wafer cleaning and surface preparation technologies for future applications.

Abstract: The EUV lithography process is increasingly employed in the advanced semiconductor process, and high-NA EUV equipment is being developed for high-volume manufacturing. Therefore, particle contamination control for EUV masks is a key success factor for the yield increase of the EUV lithography process in the future and for this, the needs of EUV pellicle will increase. Although materials for the EUV pellicle membrane are still under development, unlike ArF pellicles, its fabrication is complicated and difficult, resulting in low production yield and high production costs. To reduce EUV pellicle operating costs, it is possible to consider ways to reduce production costs by enhancing the yield of EUV pellicle or reusing particle contaminated EUV pellicle by particle removal. Both methods require damage-free particle removal technology of EUV pellicle. Pinpoint particle removal technology, a cleaning technology that satisfies these requirements, was developed, and particles bigger than 5 μm could be removed in a cleanroom environment without damaging fragile EUV pellicle. The possibility of the damage-free EUV pellicle cleaning process was verified through the process window evaluation of Pinpoint cleaning technology.

Abstract: In this paper, we investigate the use of a wet cleaner developed to dissolve residues left after plasma etching selectively to aluminum in new applications such as the removal of various resilient ionic and halides-based surface contaminants. The compromise between efficiency and selectivity of this fluorinated acid cleaner makes it an interesting chemistry for many cleaning steps during wafer manufacturing. Two new applications were investigated: the selective removal of fluoride-based defects on aluminum pads and surface decontamination of various ionic metals with low substrate consumption. These studies showed very encouraging results in beakers level tests, but also on partly industrial equipment, opening new possibilities for this cleaner. Indeed, “water lily” defects removal seems to be possible with a low aluminum consumption in TechniClean IK73. Decontamination study carried out in static bath and in single wafer tool showed rather similar results, enabling static bath protocol and ionic metals removal to be validated and VPD-ICPMS results, after a short process time in a single wafer tool were very promising with metal levels close to the lower limit of detection of all elements tested.

Abstract: Many excavations contain potsherds that have suffered from different aspects of deterioration, including salt crystallization, dirt deposition, and soot. The different stains play an important role in the deterioration of archaeological pottery, such as the disappearance of the original surface and discoloration. The present study aims to evaluate some nanoparticles in an innovative poultice form to be used to clean archaeological pottery. In this study, the nanoparticles (NPs) of titanium dioxide (TiO₂) and zinc oxide (ZnO) have been prepared at 5% and in the poultice form to be used for the cleaning process of archaeological potsherds excavated from the excavation site at Abusir. Different analytical techniques, such as transmission electron microscope (TEM), digital microscope, stereomicroscope, scanning electron microscope (SEM-EDX), X-ray diffraction (XRD), and measurement of color change have been used to characterize the studied potsherds and evaluate the cleaning process. The results of the XRD analysis showed the presence of some main minerals, such as albite, quartz, diopside, hematite, spinel and chloride salt (halite). The results of the microscopic investigation used in the evaluation process revealed that using TiO₂ NPs poultice perfectly removed soot and dust deposits from the surface, and the cleaned surface became smooth. The results of elemental analysis by (SEM-EDX) showed the effective reduction in the percentage of salts and soot from the treated potsherds by TiO₂ NPs poultice to be 3.38% and 6.68%, respectively. The measurement of color change revealed that the treated potsherds by TiO₂ NPs poultice gave the highest (ΔE*=9.41), confirming this poultice's effective role in cleaning archaeological potsherds. Based on the results of different analytical techniques used in the evaluation process, the TiO₂ NPs poultice is recommended for use in the cleaning process of archaeological pottery.

Abstract: The article discusses the technologies used in the manufacture of liquid rocket engines filter elements. The analysis of the most widely used methods in the aerospace industry for obtaining grooves and holes in metal filters is carried out, as well as progressive methods for their production are proposed. Special means of technological equipment for the fine filter elements manufacture using electroerosion treatment have been developed.

Abstract: The cleanness of the wafer backside is vital in improving process quality and device yield for advanced technology nodes, 10, 7 nm, and beyond [1,2]. Defects such as particles and scratches on the wafer backside could be sources of local deformation of a wafer [2], causing the photolithography hotspot generation [3], the local variation of film thickness, wafer breakage, so on. The micron-size particle defects are easily generated during deposition, etch, CMP processes, and they can be easily transferred to subsequent processing tools. The particles will be exposed to various process conditions such as high compressive stress and high temperature, and it can be seen on the end-effector and wafer chuck in the process chamber. In order to make the wafer backside clean, we need to understand the behavior of particle adhesion and removal, especially at high temperature. In this paper, the adhesion behavior of aged particles at high temperature and the footprint of them were studied.

Abstract: Abrasive Water Jet (AWJ) machining has proven to be an effective and versatile technique for milling various kinds of materials, even with low machinability such as aerospace grade titanium alloy Ti6Al4V. Many studies have been performed in order to master this technology and produce geometrically accurate shapes. However, in the context of bonding repairs which require surfaces free from foreign bodies, AWJ machining presents a significant drawback in form of abrasive grit embedment. The goal of this present work is then to investigate the effect of a post-AWJ machining cleaning operation using Plain Water Jet process (PWJ – i.e. without abrasive particles) on the surface quality and material properties. For this, several characterization techniques were employed. It was concluded that the contamination has been reduced by 65% without noticeable changes in depth of cut and crater volume. The AWJ milling operation produced surface and subsurface hardening as well as biaxial compressive residual stress, mostly piloted by the jet pressure. PWJ cleaning reduced the depth of hardening without clear modification in surface hardness.

Abstract: Poor transmission of sunlight through the top glass cover is one of the major hindrances in realizing better performance from a PV module. Adoption of appropriate cleaning technique might enhance glass transmissivity to a good extent. In the present study, the effect of manual cleaning with nylon sponge, microfiber cloth and nylon brush on optical and mechanical properties of PV glass have been investigated for several samples of borosilicate and soda lime glasses. Examination of transmittance of the samples using UV-VIS NIR scanning spectrophotometer confirmed enhanced transmissivity. Borosilicate glass exhibited better performance in terms of transmissivity as compared to soda lime glass. Cleaning with nylon sponge shows the highest transmittance of 91.98% for borosilicate glass at 630 nm wavelength and that of 91.094% with soda lime at 525 nm wavelength.

Abstract: In recent years, the development of new procedures and solutions in the field of conservation has been very significant. The purpose of this article is to collect the main contributions of nanotechnology, in its multifunctional solutions applied in heritage, to offer a global vision of the state of the matter for both scientists and restaurateurs.Nanomaterials offer some advantages over traditional products, improved compatibility and efficiency and reducing the use of toxic organic solvents for humans and the environment. Solutions have been developed for both inorganic supports and organic supports for artistic, architectural and archaeological heritage. Especially relevant are the advances in consolidation processes, pH regulation and / or cleaning / elimination of alteration products on murals, frescoes or stone and in materials composed of cellulose and collagen.Also, nanotechnology is still a recent science and has yet to answer certain questions about its use protocols and reduce the possible risks to health.