Authors: Qian Yu Cheng, Kevin W. Kayang, Ze Yu Chen, Shan Shan Hu, Balaji Raghothamachar, Michael Dudley, Dilip Gersappe, Andrey Soukhojak, Sungchul Baek
Abstract: Indentation behavior induced by the presence of foreign inclusions in a PVT-grown 4H-SiC wafer is investigated through synchrotron X-ray topography, which revealed the generation of dislocation arrays from the inclusion center along six <11-20> directions. Grazing-incident topographs shows these dislocation arrays exhibit contrast configurations of opposite-signed TED pairs or BPD segments. This correlates with dislocation loops generated due to prismatic punching, and dislocation configuration variation is dependent on the position of prismatic loops with respect to the wafer surface. The stress induced by the inclusion embedded in the 4H-SiC matrix is estimated from the difference in the thermomechanical properties, as the crystal is cooled from the growth temperature.
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Authors: Yafei Liu, Campbell Bouch, Pete Schunemann, Ryan Philpott, Mary Safko, Danielle Hamann, Mason Dupre, Andrew Goldberg
Abstract: Axial sliced samples from 4H-SiC boules grown by PVT method were characterized by lab-based X-ray topography systems. Valuable information about dislocation behaviors during crystal growth was revealed. TSD/TMD propagation during PVT growth was studied. The different TSD/TMD propagation directions inside and outside the facet region were identified as the direct cause of the reduced TSD/TMD density at the facet boundary on some c-plane wafers. A defect reduction mechanism was proposed based on this discovery. It was observed that TSDs/TMDs were emitted by a void structure formed during crystal growth, which explained the elevated TSD/TMD density in the center regions of some wafers. The formation mechanism of such defect is different from the previous studies and remains under investigation.
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Authors: Mital U. Lad, Kamleshkumar Raval, Santilata P. Sahoo, Chandan R. Vaja
Abstract: A semi-organic single crystal of potassium hydrogen phthalate (KHP, K(C6H4COOH.COO)) doped with Nickel Chloride (NiCl2) and Glycine (C₂H₅NO₂) was successfully harvested at room temperature to enhance the characteristics of KHP using a slow evaporation approach. The concentration of 1 mol % of Nickel Chloride and 6 mol % Glycine was used during the fabrication of the Nickel Chloride and Glycine doped KHP single crystal. Powder X-Ray diffraction (XRD), ultraviolet visible spectroscopy (UV-Vis), and Fourier transform Infrared (FTIR) analysis were used to analyze the grown single crystal. Powder XRD investigation verified an orthorhombic crystal structure and lattice parameter .To evaluate optical energy band gap and optical transparency using UV-Vis spectral. According to, FTIR analysis, and dielectric studies, it is evident that the crystal modification noticeably by adding dopant.
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Authors: Qian Yu Cheng, Yafei Liu, Ze Yu Chen, Shanshan Hu, Balaji Raghothamachar, Michael Dudley, Vladimir Pushkarev, Kevin Moeggenborg, Gil Chung, Edward Sanchez, Andrey Soukhojak
Abstract: The influence of seed preparation on crystal defect generation is studied by investigating the effect of damage from surface scratches not completely removed during polishing on the seed crystal on the nucleation and evolution of dislocation arrays. Synchrotron X-ray topography is conducted on several wafers sliced from a PVT-grown 4H-SiC boule. Topographic results in conjunction with ray tracing simulation reveal the generation of TSD/TMD and TED arrays associated with the scratches in the newly grown wafer adjacent to the seed. Configuration transformation of those arrays is observed as these opposite-signed dislocation pairs composing the arrays were affected by the overgrowth of macro-steps when propagating into the newly grown crystal.
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Authors: Takeshi Okamoto, Hideyuki Uehigashi, Takahiro Kanda, Nobuyuki Ohya, Akiyoshi Horiai, Soma Sakakibara, Takashi Kanemura, Kiyoshi Betsuyaku, Norihiro Hoshino, Isaho Kamata, Hidekazu Tsuchida
Abstract: To reduce manufacturing costs, high-quality 150 mm 4H-SiC wafers were grown at over 1.5 mm/h by high-temperature chemical vapor deposition. The dislocations in the initial growth stage did not increase compared with those in the seed crystal. The dislocation densities decreased during crystal growth, and the densities of threading dislocations and basal plane dislocations at the growth thickness of 7.1 mm were 1186 and 211 /cm2, respectively. The resolved shear stress, which is the cause of the increase in dislocations during growth, was calculated based on thermal fluid simulations; the shear stress of the grown crystal with a flat surface was small compared with that of the convex-shaped crystal. The dislocations did not increase likely because the crystals grown at high speeds were relatively flat. In addition, the decrease in dislocations was attributed to the frequent annihilation of dislocations due to the growth at a high temperature (2490 °C).
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Abstract: Nucleation and growth conditions of single-crystallinity control are convincingly elaborated by multi-scale mathematical modeling of heat and mass transport to totally abate undesirable weld defects, e.g. disoriented crystal and hot cracking inside molten pool of nonequilibrium crystallization, in order to illustrate the usefulness of predictive capability through theory and experiment procedures. Crystal growth is complicated by crystallinity-dependent thermal and chemical driving forces in front of dendrite tip during viable laser surface modification of Ni-based single-crystal superalloy. These two thermal metallurgical determinants play crucial role in crack-insusceptible columnar crystal growth, which is favorably oriented throughout weld depth. There is particular challenge in complete elimination of disoriented crystal, i.e. stray grain formation, for acceptable surface quality. Conservative (001)/[100] crystalline orientation is desired to diminish Al concentration and supersaturation, and morphologically satisfy epitaxial growth kinetics to successfully lessen central cracking with satisfactory variability of laser power and welding speed. Comparatively, (001)/[110] crystalline orientation is disadvantageous to asymmetrically augment Al concentration and supersaturation and aggressively increase interface instability, microstructure heterogeneity and hot cracking vulnerability along disoriented crystal boundaries. Disoriented crystal is increasingly withstood if the Al concentration and supersaturation in front of dendrite tip are low enough and crack-unsusceptible part is relatively large enough in case of attractive (001)/[100] crystalline orientation with optimal range of heat input to ameliorate microstructure homogeneity. Crystalline orientation region varies with diverse welding configurations, and epitaxy across solid/liquid interface is also sensitive to heat input of laser processing, which necessitate high efficient welding conditions optimization. Considerable effort is made to distinguish diffusion-driven crystal growth between a series of combinations of multiple welding conditions, such as critical welding configuration and heat input. Metallographically, the morphologies of crystal growth and hot cracking are experimentally observed to consistently support kinetics calculation result and well explain correlation between solidification behavior and crystal growth.
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Authors: Takeshi Okamoto, Takahiro Kanda, Yuichiro Tokuda, Nobuyuki Ohya, Kiyoshi Betsuyaku, Norihiro Hoshino, Isaho Kamata, Hidekazu Tsuchida
Abstract: To reduce the cost of silicon carbide (SiC) substrates, we have developed a high-temperature chemical vapor deposition (HTCVD) method for high-productivity crystal growth. We have conducted research using crystals of diameter 4 inches or less. In order to further reduce the cost, development of a 150-mm substrate has been demanded. With increasing crystal diameter, the occurrence of cracks should be suppressed efficiently. The internal structure of the furnace was designed to reduce the distribution of temperature in the radial direction of the crystal, ultimately reducing the stress responsible for the formation cracks. We demonstrated a 150-mm 4H-SiC substrate without cracks using by HTCVD method.
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Authors: Xiang Jie Wang, Fang Yu, Peng Wei Li, Wei Sun, Hong Juan Tan, Lei Li, Jian Zhong Cui
Abstract: Refining grains are important to obtain sound cast billets suitable for further processing. The structure refinement of low frequency electromagnetic field (LFEF) during the aluminum alloy semi-continuous casting process has been confirmed by many researchers. In this work, effects of the electromagnetic agitation on the crystal growth were investigated during the pure aluminum slow cooling process. The results showed that the grain refinement effect by electromagnetic agitation mainly occurred at the first half period of crystal growth. With increasing of applying LFEF treated time, the fine grain occupied the whole section of ingot, and the ratio of fine grain zone to the whole section was proportional to the treated time.
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Authors: Agus Geter Edy Sutjipto, Heng Hooi Chi, Ali Shaitir, Ari Legowo
Abstract: The fabrication technique applied in this research to grow ZnO crystal is known as ECH method. It is a preferred method due to its low cost, simplicity in operating and low growth temperature. However the condition of ECH method to produce the optimum crystal growth has not been studied further. The objectives of this research are to synthesize ZnO ceramic pellets, to produce ZnO micro/nanostrcutures on ZnO ceramics bar by ECH method, as well as to characterize and analyze structural, morphological, and optical properties of ZnO crystals grown. ZnO pellets were formed by pressed at 3, 4, 5 tons and sintered at 1,100 °C in air for 4 and 72 hours. ZnO ceramic bar was joule heated by direct current of 2 A and 3 A. The result is the grain size of ZnO pellets increased with increasing sintering time and pressing pressure. XRD results indicated mostly crystal prefer to grow along (100) orientation. SEM images showed crystals grown was in a variety of shapes and sizes. PL measurements at room temperature revealed high intensity peak of in visible region in which yellow-level emission was observed from ZnO crystals grown.
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Authors: Aw Fong Ling, Ali Shaitir, Ari Legowo, Agus Geter Edy Sutjipto
Abstract: There are three objectives to be achieved in this research which include to synthesis high purity ZnO pellets with different sintering time and green body pressure by using powder metallurgy process, the growth of ZnO crystal on ceramic bar by applying different current when conducting electric current heating (ECH) method and the characterization of ZnO crystal growth. In this research, high purity of ZnO powder is grinded and compressed at 3.5 tons, 4.5 tons and 5.5 tons to fabricate ZnO green pellets. Then, the ZnO green pellets are sintered for 3 hours and 5 hours. Next, the pellets are cut into bars and apply ECH method. The amount of current applied for the crystal growth are 2A and 3A. Finally, the crystal grown on the ZnO ceramic bar is characterized using X-Ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Ultraviolet-visible Spectroscopy (UV-Vis) and Photoluminescence Spectroscopy (PL). High purity ceramic pellets are successfully synthesis by powder metallurgy process. By conducting ECH method, crystal are grown on the surface of ceramic bar. Most crystal structure found in ZnO ceramic bar is needle-liked rod structure which is hexagonally formed by many nanorod. The crystal grown in (100) orientation with the crystalline size of from 57.80 nm to 100.31 nm. The band gap energy obtained from UV-Vis were found between 3.2 eV to 3.4 eV which is nearly similar to the theoretical value of 3.37 eV. Lastly, PL emission measurement give the peak that range between 579 nm to 587 nm which indicate that the sample exhibit yellow colour. Among three different pressure applied, 4.5 tons gives the lowest emission energy. It is considered as the critical pressure in the synthesis of ZnO crystal. The intensity of PL is considered inversely proportional to intensity of XRD in [100] direction. Pressing pressure doesn’t show significant effect on the crystal growth of ZnO but current applied during ECH method and sintering time do give effect on UV-Vis absorption spectra and XRD result respectively.
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