Authors: Guillaume Gelineau, Julie Widiez, Emmanuel Rolland, Krenema Vladimirova, Alexandre Moulin, Vladimir S. Prudkovskiy, Nicolas Troutot, Patrice Gergaud, Denis Mariolle, Sophie Barbet, Vincent Amalbert, Gérard Lapertot, Karine Mony, Séverin Rouchier, Romain Boulet, Guillaume Berre, Walter Schwarzenbach, Yann Bogumilowicz
Abstract: The Smart CutTM process offers an advantageous opportunity to provide a large number of performance-improved SiC substrates for power electronics. The crystalline quality and the electrical activation of the 4H-SiC transferred layer are then at stake when it comes to the power device reliability. In this study, we find that the H+ ion implantation used for the Smart CutTM process leads to electrical deactivation of dopants and partially disorders the material. The transferred layer fully recovers its initial crystalline quality after a 1300°C anneal, with no further evolution beyond this temperature. At this point however, the n-type dopants are still inactive. The dopant reactivation occurs in the same temperature range than that of implanted nitrogen: between 1400°C and 1700°C. After 1700°C, the initial doping level of bulk SiC is recovered.
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Authors: Takeshi Okamoto, Hideyuki Uehigashi, Takahiro Kanda, Nobuyuki Ohya, Akiyoshi Horiai, Soma Sakakibara, Takashi Kanemura, Kiyoshi Betsuyaku, Norihiro Hoshino, Isaho Kamata, Hidekazu Tsuchida
Abstract: To reduce manufacturing costs, high-quality 150 mm 4H-SiC wafers were grown at over 1.5 mm/h by high-temperature chemical vapor deposition. The dislocations in the initial growth stage did not increase compared with those in the seed crystal. The dislocation densities decreased during crystal growth, and the densities of threading dislocations and basal plane dislocations at the growth thickness of 7.1 mm were 1186 and 211 /cm2, respectively. The resolved shear stress, which is the cause of the increase in dislocations during growth, was calculated based on thermal fluid simulations; the shear stress of the grown crystal with a flat surface was small compared with that of the convex-shaped crystal. The dislocations did not increase likely because the crystals grown at high speeds were relatively flat. In addition, the decrease in dislocations was attributed to the frequent annihilation of dislocations due to the growth at a high temperature (2490 °C).
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Authors: Jong Hwi Park, Byung Kyu Jang, Jung Woo Choi, Eunsu Yang, Jung Gyu Kim, Sang Ki Ko, Myung Ok Kyun, Kap Ryeol Ku, Dae Sung Kim, Won Jae Lee
Abstract: 6-inch 4H-SiC crystal ingot was successfully separated from a seed holder by the contraction enhancement of adhesive. The resin used as an adhesive with 10~30% in contraction ratio during the cooling was selected. The crack between seed holder and grown SiC crystal was observed to be formed after the cooling procedure and the crystal was easily separated from the seed holder without any machining process for the separation. The warp value and the rocking curve value of SiC crystal grown with modified adhesive was observed to be smaller than those of SiC crystal with conventional method.
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Authors: Byung Kyu Jang, Jong Hwi Park, Jung Woo Choi, Eunsu Yang, Jung Gyu Kim, Sang Ki Ko, Myung Ok Kyun, Kap Ryeol Ku, Yeon Suk Jang, Won Jae Lee
Abstract: The modified hot-zone design, consisting of a new design and new materials for the backside of SiC seed holder was adopted for reducing stress in grown SiC crystal ingot and for reducing the warpage of 6-inch SiC wafer. Crucible lid on the backside of SiC seed holder was designed to be movable during the growth process. Based on the warp value and mapping measurement of FWHM (Full width at half maximum) value in X-ray rocking curve, the crystal quality of SiC crystals grown with new hot-zone design was observed to be better than conventional design.
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Authors: Chae Young Lee, Jeong Min Choi, Dae Sung Kim, Mi Seon Park, Yeon Suk Jang, Won Jae Lee, In Seok Yang, Tae Hee Kim, Xiu Fang Chen, Xian Gang Xu
Abstract: Two SiC crystals were grown using SiC source powder with different level of purity and then the effect of the purity of SiC source materials on the final electrical properties has been systematically observed. Furthermore, the variation of vanadium amount according to the growth direction of vanadium doped semi-insulated SiC single crystals has been investigated. The quality of SiC crystal grown using SiC source powder with higher purity was definitely better than SiC crystal with lower purity. SiC crystals having an average resistivity value of about 1×1010 Ωcm were successfully obtained. In the result of COREMA measurement, the use of high purity SiC powder was revealed to obtain wafers with better uniformity in resistivity value.
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Authors: Jung Woo Choi, Jung Gyu Kim, Byung Kyu Jang, Sang Ki Ko, Myung Ok Kyun, Jung Doo Seo, Kap Ryeol Ku, Chae Young Lee, Won Jae Lee
Abstract: 4H-SiC single crystal was successfully grown with source powder modified by the pretreatment process in order to improve polytype stability of SiC crystal. To increase C/Si ratio in SiC source powder, SiC source powder was mixed with liquid carbon source and then pre-heated at 1200°C. SiC single crystal grown with modified source powder exhibited complete 4H polytype and the crystal quality of SiC crystal grown by modified source power was definitely better than conventional source powder
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Authors: Jeong Min Choi, Chae Young Lee, Dae Sung Kim, Mi Seon Park, Yeon Suk Jang, Won Jae Lee, Wei Fan, Hao Qu, Xiu Fang Chen, Xian Gang Xu
Abstract: The present research was focused on the effect of porous graphite plate in TaC-coated crucible on crystal quality and resistivity of semi-insulating SiC crystals. Two SiC crystals grown with/without porous graphite plate in TaC-coated crucible were systematically compared. 6H-SiC polytype was obtained on both crystals regardless of porous graphite plate. The quality of SiC crystal grown using porous graphite plate placed in the TaC-coated crucible was slightly better than SiC crystal without porous graphite plate. SiC crystals having an average resistivity value of about 1×1010 Ωcm were obtained. In the result of COREMA measurement, the use of porous graphite plate tends to obtain wafers with better uniformity in resistivity value.
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Authors: Wei Fan, Hao Qu, Sung Il Chang, Brian Kozak, Gregory Shaffer, Alex Galyukov, Won Jae Lee
Abstract: Tantalum carbide (TaC) coating, produced in an ultrahigh temperature chemical vapor deposition (CVD) process, exhibited high thermal and chemical stabilities, low emissivity, and high purity. The present research investigated through modeling the TaC emissivity and reactivity impacts on the temperature, C/Si ratio and growth rate in SiC physical vapor transport (PVT) process. The TaC coating effect was further validated by SiC crystal shape and quality through a series of growth experiments. As our study revealed, TaC coating can act as a protection and isolation layer to extend graphite component life, improve radial temperature uniformity, maintain SiC sublimation stoichiometry, suppress impurity migration, and reduce energy consumption. Ultimately a TaC-coated graphite crucible set is expected to improve SiC PVT process control and product quality.
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Authors: Elaheh Moghaddam, Amir Ali Youzbashi, Asghar Kazemzadeh
Abstract: Recent advances in nanomaterials have been led by new synthetic methods that provide control over size, morphology and crystal quality of materials. The present study is tried to discuss the effect of ultrasonic waves on characteristics of ZnO quantum dots by study of UV absorption, photoluminescence spectroscopy, X ray diffraction patterns, transmission electron microscopy and growth stages of two samples prepared by sonochemical and conventional methods. The results demonstrated that the quantum dots synthesized under ultrasonic waves were of smaller size with more narrow size distribution. Also, improvement of their crystal quality was inferred from investigation of visible emission intensity. The use of ultrasonic waves caused the phase purity of nanocrystals obtained by complete conversion of precursors into ZnO. Further, the study of their growth stages indicated that the rapid nucleation and nucleation growth were followed by Ostwald ripening process which improve the crystal properties. The better crystal quality of ultrasonic prepared ZnO indicated the enhancement of its applicability to be used for optoelectronic applications.
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Authors: Hee Won Shin, Hee Jun Lee, Hwang Ju Kim, Dong Hoon Lee, Mi Seon Park, Yeon Suk Jang, Won Jae Lee, Im Gyu Yeo, Myong Chuel Chun, Si Hyun Lee, Jung Gon Kim
Abstract: The present research is focused to investigate a role of the porous graphite (PG) plate that could improve the quality of 4H-SiC crystal. The grown crystal in porous graphite inserted crucible showed the lower intensity of Al, B and Ti impurity concentration than SiC crystal grown in conventional crucible. The porous graphite plate before and after the growth process has been investigated by a Raman spectroscopy and a photoluminescence spectrum (PL). According to the analysis result, it was confirmed that the porous graphite plate had the effect of suppressing impurities supplied to SiC single crystal during the growth process.
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