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Articles by keyword: «Fluorine»

• Ab-Initio Investigations on Diffusion of Halogen Atoms in GaAs
  Published in: Defects in Semiconductors 19 (p1821)
• An Introduction to the Glass Formation and Properties of Ca-Si-Al-O-N-F Glasses
  Published in: Nitrides and Oxynitrides III (p17)
• Ca-SiAlON Glasses: Effects of Fluorine on Glass Formation and Properties
  Published in: Innovation in Ceramic Science and Engineering (p165)
• Characteristics of the SiN Uniaxial Strained NMOSFET with Channel Fluorine Implantation
  Published in: Manufacturing Science and Technology (p3178)
• Deposition and Characterisation of Polycrystalline Silicon for Low Temperature Thin Film Transistor Fabrication
  Published in: Polycrystalline Semiconductors IV (p609)
• Direct Evidence of Fluorine-Related Defects in F⁺, BF⁺ and BF₂⁺ Implanted Silicon by Positron Annihilation
  Published in: Positron Annihilation - ICPA-11 (p683)
• Effects of Anolyte Concentration on Removal of Fluorine from Contaminated Soil by Electrokinetic Treatment
  Published in: Advances in Environmental Science and Engineering (p2500)
• Effects of Pair-Mineralizer on Burnability of Clinker and Formation of Mineral
  Published in: Eco-Materials Processing and Design X (p209)
• Electrical Characteristics of Fluorine Passivated MOCVD-TiO₂ Film on (NH₄)₂S_x Treated GaAs
  Published in: High-Performance Ceramics V (p232)
• Emissions in the Heavy Clay Industry
  Published in: Frontiers for Engineering Materials (p249)
• Fluoride-Containing Bioactive Glasses
  Published in: Glass – The Challenge for the 21st Century (p299)
• Recyclable Fluorine-Based Cleaning Solvents for Resist Removal
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p327)
• Role of Implantation-Induced Defects in Surface-Oriented Diffusion of Fluorine in Silicon
  Published in: Positron Annihilation - ICPA-10 (p545)
• Slow Positron Annihilation in Ion-Implanted Silicon
  Published in: Defects and Diffusion in Ceramics X (p21)
• Synthesis and Characterization of Polyacrylate Latex Containing Fluorine and Silicon
  Published in: New Trends in Mechatronics and Materials Engineering (p392)