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Articles by keyword: «Gate Oxide Integrity»

• A Study on Germanium as a Contaminant Source in Semiconductor Fabrication Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p255)
• Influence of Point Defect Concentration in Growing CZ-SI on the Formation Temperature of the Defects Affecting Gate Oxide Integrity
  Published in: Defects in Semiconductors 18 (p1731)
• Investigation of Wet Clean Induced Dielectric Surface Static Charge and its Impact on Gate Oxide Integrity
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p71)
• Lattice Defects in High Quality As-Grown CZ Silicon, Studied with Ligth Scattering and Preferential Etching Techniques
  Published in: Defects in Semiconductors 18 (p1755)
• Review of the Influence of Micro Crystal Defects in Silicon Single Crystals on Gate Oxide Integrity
  Published in: Defects in Semiconductors 18 (p1683)
• Single Step Alkaline Cleaning Solution for Advanced Semiconductor Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p23)
• The Dynamic Aspects of Electrochemical Reaction Cells in Selectively Inducing Defects on Silicon Surface
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p91)