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Articles by keyword: «Glass Substrate»

• Multi-Sphere Mirror Design of YAG Laser Applied for Glass Substrate Cutting
  Published in: Advances in Materials and Processing Technologies II (p1246)
• Polish Properties of Nano-Cluster Diamonds on Glass Substrates
  Published in: Advances in Abrasive Technology XIII (p917)
• Polishing Mechanism of Glass Substrates with its Processing Characteristics by Cerium Oxide and Manganese Oxide Slurries
  Published in: Advances in Precision Engineering (p141)
• Polycrystalline Silicon on Glass Substrates for Thin Film Solar Cells
  Published in: Polycrystalline Semiconductors IV (p515)
• Polycrystalline Silicon Thin Film Transistors for Liquid Crystal Displays
  Published in: Polycrystalline Semiconductors III (p553)
• Polycrystalline Silicon Thin Films on Glass for Photovoltaic Cell Applications
  Published in: Polycrystalline Semiconductors III (p459)
• Preparation and Characterization of PZT Thin Films on ITO/Glass Substrate by CSD
  Published in: Electroceramics in Japan VIII (p41)
• Process to Fabricate High Performance Solid Phase Crystallized n-Type and p-Type Thin Film Transistors on Glass Substrate
  Published in: Polycrystalline Semiconductors V (p547)
• Selective Adsorption of Microorganisms onto Artificial Siderophore-Modified Glass Surface
  Published in: AICAM 2005 (p251)
• Study on Glass Strength at High Speed Edge Rounding for LCD
  Published in: Advances in Abrasive Technology XI (p448)
• Study on Micro Blasting of Glass for Micro Channel Forming
  Published in: Advances in Abrasive Technology XII (p373)
• Study on the Development of Resource-Saving High Performance Slurry - Polishing/CMP for Glass Substrates in a Radical Polishing Environment, Using Manganese Oxide Slurry as an Alternative for Ceria Slurry
  Published in: 12th INTERNATIONAL CERAMICS CONGRESS PART C (p65)
• Synthesis of Magnetic Thin Films on Glass Substrates Using NH₃ Vapors
  Published in: Advances in Metallic Materials and Manufacturing Processes for Strategic Sectors (p762)
• Towards Complementary Metal-Oxide-Silicon Thin-Film Devices with a New Structure
  Published in: Polycrystalline Semiconductors VII (p429)
• Transparent and Antiglare Conducting Coatings Deposited by Wet Chemical Processes
  Published in: Advanced Materials Forum I (p555)