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Articles by keyword: «HF»

• A Novel Vapor Phase Etching Process for Si
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p239)
• Application of Single-Wafer Wet Cleaning Prior to Epitaxial SiGe Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p173)
• Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p243)
• Characteristic of Nanoporous SiO₂ Thin Film Prepared by Sol-Gel Method with Catalyst HF
  Published in: PRICM-5 (p1733)
• Co-Solvent Effect on the HF/CO₂ Dry Etching of Sacrificial Oxides
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p235)
• Deposition Behavior of Volatile Acidic Contaminants on Metallic Interconnect Surfaces
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p365)
• Effect of Dopants on the Dissolution Behavior of Silicon Substrates in HF-Based Cleaning Solutions
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p139)
• Effect of the Electrode Geometry on the Diffusion-Current Problem of the Rotating Porous Silicon Electrode in HF Solution
  Published in: Thin Films and Porous Materials (p149)
• Electrochemical Properties of TiN and ZrN Coated Ti-Hf Alloy
  Published in: Advanced Materials and Processing (p813)
• Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p3)
• Evaluation of Surface Roughness of Quartz Glass Substrate in Fabrication Process for Neutron Focusing Mirror
  Published in: Advances in Abrasive Technology XIV (p647)
• HF Based Solutions for HfO₂ Removal; Effect of pH and Temperature on HfO₂: SiO₂ Etch Selectivity
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p97)
• Impact of Galvanic Corrosion on Metal Gate Stacks
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p215)
• Impurity Diffusion of Titanium, Zirconium and Hafnium in Gold
  Published in: Diffusion in Materials DIMAT 1996 (p109)
• Low Si Recess on Cleaning Process by Dilute HF/SC-1 with Megasonic
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p209)