Papers by Keyword: Haze

Abstract: The sapphire substrate have a significant impact on reducing the light scattering loss and in accordance with the crystalline surface and can improve the light emission efficiency is the surface roughness of the sapphire LED is an important factor. When the CMP process after measuring the transmittance, haze, and surface roughness had a transmittance of 84% or more transmittance at all wavelengths, regardless of the thickness it was confirmed that the haze also has a low value, regardless of the thickness. Was confirmed that the surface roughness is greater the thicker the thickness of the sapphire it affects the pressure of the CMP polishing and then take a lot of importing a low surface roughness value of the thickness of the sapphire CMP process the surface roughness value.

Abstract: For fresh-cut and ready-to-eat packaging films, antifog additives (AFs) are commonly used to suppress the formation of water droplets on film surface. To date, the type and dosage of antifogging for PLA based film are less studied. Therefore, in this research, films incorporated with antifog additive were fabricated by cast extrusion technique. The migration behavior of commercial polyglycerol ester as selected AF was investigated. The cold fog test results showed that 3.5 and 5 wt% of AF in 20PBAT/80PLA single layer film can provide clear films without droplet of water within 7 days and 3 hours, respectively. For 2-layer films, the presented of AF in seal layer as 95(20PBAT/80PLA)/5 (polyglycerol ester) and core layer of PLA were prepared having different thicknesses of seal layer/core layer of 20/15 and 10/15 μm. The migration rate of AF in thin 2-layer film (10/15 μm) appeared to be higher than that in 20/15 μm film. Films’ surface could become clear without water droplet (rating scale > 8) within 4 days for 10/15 μm and 7 days for 20/15 μm films. Haze of films was analyzed by haze meter. Haze of 10/15 μm film was decreased from 7 to 4.4, while that of 20/15 μm film was also decreased from 10 to 7.9 when AF appeared on its surface. Both films can be a peelable PLA based lidding film product with low haze (< 10 %) and antifog performance (within 1 month). In addition, 10/15 μm film can be an easy peel lidding film since its peel strength was in an easy peel range (6-10 N/15 mm).

Abstract: A one-step wet-etching method was developed to prepare the transparent conducting double-layered ZnO:Al films with textured surface for improving the light trapping ability.In this work, we investigated the effects of different deposition and re-deposition conditions including Ar flow rate, working pressure and substrate temperature on the light trapping properties of double-layered ZnO:Al films. Obvious changes for surface morphology of double-layerd films were observed, which displayed the significant influence of the re-deposition process. The double-layered ZnO:Al films presented low resistivity, high optical transmittance and haze value in the visible region, which can meet the requirements of front electrodes.

Abstract: The performance of a new cryogenic aerosol process was evaluated for cleaning nanoparticles and providing damage-free processing. Particle Removal Efficiency (PRE) tests conducted with wet deposited 40 nm, 30 nm and 18 nm silica particles on 300 mm wafers demonstrated cleaning efficiencies above 80%. Damage-free capability of the cryogenic aerosol process was evaluated with poly-silicon lines with an aspect ratio of approximately 9:1. These results highlight the potential of this new cryogenic aerosol to provide semiconductor device yield benefits by reducing small particulate contamination without causing pattern damage.

Abstract: Sulfuric Peroxide Mixture (SPM) showed excellent cleaning efficiency for organic contamination as well as metal or metal oxide particles on photomask surface. In order to reduce haze formation during litho process for ArF photomask, it is necessary to remove any ion sources on photomask, such as sulfate ion, ammonium ion, etc. In this paper we reported a new cleaning method, treating photomask with 172nm UV followed by hot DI rinse, reduces residual sulfate ion in MoSiN_xO_y surface and quartz surface by 50% and 80% respectively comparing to traditional cleaning process. We believe that this new process has the potential to greatly alleviate the haze issue caused by sulfate ion and helps increase the lifetime of photomasks

Abstract: For the present situation of spotty mask fabrics in current market, the paper used natural fiber silk as raw materials for the study of anti-fog and haze mask fabrics. The paper design five different programs and any one sample in every program has different weft density or warp and weft yarn fabric specifications. Make total of 15 kinds of trial samples and do a series of testing of fabric performance. Through testing the pore size value, the filtration efficiency, resistance value and other indicators and analyzing the results, do research on filtering properties of the fabrics. The conclusions have certain guiding significance in product development.

Abstract: Compound air pollution is becoming one of three major problems of urban ecological security in China which is experiencing a rapid growth. This paper examined how to establish the "10 Portions Force" model so as to build up the promoting mechanism of government environmental regulation behaviors’ ability, which based on the time and spatial effects of China's haze pollution.

Abstract: The paper starts with haze weather, gives a brief introduction on the relationship between the generation of haze and the solid waste incineration. Introduced the popular incineration technology at home and abroad, analyzed the fly ash and acid gas which comes from waste incineration. At last, the paper expounded the processing and application of fly ash in the sight of resource recovery.

Abstract: With the recent deterioration of air quality in China, different degrees of haze occurred in most areas in China, which has seriously affected the physical and mental health of the residents and greatly limited the daily production operation. Therefore, the analysis of the contributing factors and the control of haze are imminent.

Abstract: The climatic characteristics of haze and pollutants were analyzed based on surface observations obtained from Meteorological Observation Station and Environmental Monitoring Center Station from January, 2013 to March, 2014 in Wuhan. The high frequency of haze in Wuhan was from September to December, with following trend “winter>autumn>spring>summer”. According to the manual observation, haze occurrence at 11:00 was highest. The value of Air Quality Index (AQI) was highest in January and December. The primary pollutant in Wuhan was PM_2.5, secondly O₃. Horizontal diffusion played an important role in concentration of pollutants. The highest concentration of PM_2.5 converged around wind from north or east.