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Articles by keyword: «HfO₂»

• Characteristics of HfO₂ Dielectric Layer Grown by MOMBE
  Published in: Designing, Processing and Properties of Advanced Engineering Materials (p1005)
• Characterization of Dielectric Properties of Alkoxy-Derived (Y,Yb)MnO₃ Ferroelectrics /HfO₂ Stacking Layers
  Published in: Electroceramics in Japan IX (p73)
• Comparison of Reactively Sputtered HfO₂ and HfSi_xO_y Dielectrics for High Density Metal-Insulator-Metal Capacitor Applications
  Published in: Materials and Design (p893)
• Critical Thickness Threshold in HfO₂ Layers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p67)
• Crystallisation and Tetragonal-Monoclinic Transformation in ZrO₂ and HfO₂ Dielectric Thin Films
  Published in: Euro Ceramics VII (p1285)
• Dielectric Properties of HfO₂ Films Prepared on Flexible Polymer Substrates Using UV Irradiation
  Published in: Electroceramics in Japan XIII (p164)
• Effects of UV Irradiation on Microstructure and Properties of HfO₂ Films Prepared from Alkoxy-Derived Precursor Solution
  Published in: Asian Ceramic Science for Electronics III and Electroceramics in Japan XII (p91)
• Fabrication of HfO₂ Thin Film on Si Substrate by Double-Pulse Excitation PLD
  Published in: Electroceramics in Japan X (p129)
• HF Based Solutions for HfO₂ Removal; Effect of pH and Temperature on HfO₂: SiO₂ Etch Selectivity
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p97)
• Interface and Carrier Transport Behaviour in Al/HfO₂/SiO₂/SiC Structure
  Published in: Silicon Carbide and Related Materials 2007 (p759)
• Investigation of a Tb-Doped HfO₂ Single Crystal Grown by a Skull Melting Method
  Published in: Materials Integration (p81)
• Investigations Regarding Structure and Optical Properties of HfO₂ Films
  Published in: Structure Development in Condensed Matter (p233)
• Patterning of HfO₂ Thin Films Using Chemical Solution and Dielectric Properties
  Published in: Electroceramics in Japan XI (p141)
• Selective Wet Etching of High-k Gate Dielectrics
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p129)
• Surface Preparation Techniques for High-k Deposition on Ge Substrates
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p31)