Papers by Keyword: High Current

Abstract: Silicon carbide (SiC) Schottky barrier diodes (SBDs) have become critical components in power electronics due to their excellent high-voltage, high-temperature tolerance, and fast switching capability. However, increasing device area to improve current-carrying capability increases the total number of defects, which leads to an increase in reverse leakage current and reduces wafer yield. To improve current distribution uniformity within SiC module packaging, reduce system size and weight, and enhance the current-carrying capacity and high-temperature stability of a single SBD, this paper develops 750V/100A and 1200V/100A SiC SBDs on 6-inch wafers. For the 750V/100A device, the corresponding forward voltage (V_F) at forward current (I_F) of 100 A is 1.68 V. For the 1200V/100A device, the corresponding V_F is 1.75V. Calculation based on the current voltage characteristics shows that the ideal factors of 750V/100A and 1200V/100A devices are 1.01 and 1.04, respectively, which are very close to 1. It demonstrates excellent Schottky contact and a high-quality interface. The devices exhibit high-temperature stability, meeting the demands of high-temperature applications.

Abstract: Band-edge (hν_max=3.17-3.18 eV at T=293 K) injection electroluminescence (IEL) characteristics of 4H-SiC pn structures as a function of doping, electron irradiation, temperature, and current are presented. The intensity of the UV band increases with temperature in the range 290-800 K (with an activation energy E_a of about 90 meV), which is observed for the first time in a wide range of current densities from 9 A/cm² up to 2∙10⁴ A/cm². This effect is a fundamental feature of the band-edge IEL in SiC pn structures. The dependence of the intensity L on the current is of the power-law type, L~J^m; at high currents m≈1 at T=650-800 K. This result is probably the first direct observation of the diffusion current in SiC pn structures. The rise in the intensity of the band-edge IEL with increasing temperature and its decrease upon irradiation are probably due to the corresponding change in the lifetime of nonequilibrium carriers.

Abstract: The theoretical analysis and numerical simulation of electron beam generation in foil-less diode are presented. The theories of OAL, CL, and equilibrium beam model are briefly compared. All the theoretical models can give a relatively accurate solution of electron gun, and the equilibrium beam model is more appreciated. A PIC simulation tool UNIPIC is introduced and is used to analyze the behaviors of a foil-less diode. Under the conditions of 180 kV incident voltage wave and 2.5 T axial magnetic fields, we obtained the 250 kV, 1.5 kA output beam current which can be used in high power microwave generators.

Abstract: A paradigm shift in the development and utilization of power semiconductor switch technology is proposed. This new "top down" approach begins with the field-reliability of a power semiconductor switch in a power converter circuit is subjected to long-term repetitive-switching under stressful field-operating conditions. This approach is derived from extensive field-reliability data collected on state-of-the-art silicon power MOSFETs in compact computer/telecom power supplies that clearly suggests that power MOSFET field-failures were primarily caused by bulk material defects. A careful survey of power switch technologies reported to-date in Silicon Carbide (SiC) and Gallium Nitride (GaN) further suggests that excessive bulk material defects have predominantly hindered the development and commercialization of cost-effective, high-performance, and reliable high-power devices. A reliability-driven approach is likely to "unlock" the vast potential of SiC (and GaN for moderate power levels) power device technology for high-voltage and high-power switching electronics in order to impact transformative changes.

Abstract: We present our latest developments in ultra high voltage 4H-SiC IGBTs. A 6.7 mm x 6.7 mm 4H-SiC N-IGBT with an active area of 0.16 cm2 showed a blocking voltage of 12.5 kV, and demonstrated a room temperature differential specific on-resistance of 5.3 mΩ-cm2 with a gate bias of 20 V. A 4H-SiC P-IGBT exhibited a record high blocking voltage of 15 kV, while showing a differential specific on-resistance of 24 mΩ-cm2. A comparison between P- and N- IGBTs in 4H-SiC is provided in this paper.

Abstract: We present our recent developments in 4H-SiC power DMOSFETs. 4H-SiC DMOSFETs with a room temperature specific on-resistance of 3.7 mΩ-cm2 with a gate bias of 20 V, and an avalanche voltage of 1550 V with gate shorted to source, was demonstrated. A threshold voltage of 3.5 V was extracted from the power DMOSFET, and a subthreshold swing of 200 mV/dec was measured. The device was successfully scaled to an active area of 0.4 cm2, and the resulting device showed a drain current of 377 A at a forward voltage drop of 3.8 V at 25oC.

Abstract: In this work we have demonstrated the high-temperature operations of 600 V/50 A 4HSiC vertical-channel junction field-effect transistors (VJFETs) with an active area of 3 mm2. Specific-on resistance (RONSP) in the linear region of a single die is less than 2.6 mW.cm2 while the drain-source current is over 50 A under a gate bias (VGS) of 3 V. A reverse blocking gain of 54 is obtained at gate bias ranging from -13 V to -23 V and drain-source leakage current (IRDS) of 200 μA. To demonstrate the use of SiC VJFETs for high-power applications, eight 3 mm2 SiC VJFETs are bonded in a high current 600-V module. RONSP in the linear region of these eight-paralleled SiC VJFETs is 2.8 mW.cm2 at room temperature and increased to 5.35 mW.cm2 at an ambient temperature of 175 °C in air, corresponding to a shift of 0.61%/°C from room temperature to 175 °C. Meanwhile, the forward current is over 360 A at room temperature and reduces to 188 A at 175 °C at drain-source bias (VDS) of 5.25 V and VGS of 3 V.

Abstract: High-voltage normally-on VJFETs of 0.19 cm2 and 0.096 cm2 areas were manufactured in seven photolithographic levels with no epitaxial regrowth and a single ion implantation event. A self aligned guard ring structure provided edge termination. At a gate bias of -36 V the 0.096 cm2 VJFET blocks 1980 V, which corresponds to 91% of the 12 μm drift layer’s avalanche breakdown voltage limit. It outputs 25 A at a forward drain voltage drop of 2 V (368 A/cm2, 735 W/cm2) and a gate current of 4 mA. The specific on-resistance is 5.4 mΩ cm2. The 0.19 cm2 VJFET blocks 1200 V at a gate bias of -26 V. It outputs 54 A at a forward drain voltage drop of 2 V (378 A/cm2, 755 W/cm2) and a gate current of 12 mA, with a specific on-resistance of 5.6 mΩ cm2. The VJFETs demonstrated low gate-to-source leakage currents with sharp onsets of avalanche breakdown.

Abstract: Forward and reverse bias performance of 10kV, 10A and 20A junction barrier-controlled Schottky 4H silicon carbide rectifiers are presented. Over a temperature range of 30 to 200°C, the forward current-voltage curves show a normal Schottky rectifier relationship and the reverse current-voltage curves show typical PiN blocking. When operated in reverse-blocking at 125°C and 8kV, the 10A JBS rectifiers are notably stable at less than 5μA of leakage current, despite the large active area of the devices.

Abstract: In this work we have demonstrated the operation of 600-V class 4H-SiC vertical-channel junction field-effect transistors (VJFETs) with 6.6-ns rise time, 7.6-ns fall time, 4.8-ns turn-on and 5.4-ns turn-off delay time at 2.5 A drain current (IDS), which corresponds to a maximum switching frequency of 41 MHz – the fastest ever reported switching of SiC JFETs to our knowledge. At IDS of 12 A, a 19.1 MHz maximum switching frequency has been also achieved. Specific on-resistance (Rsp-on) in the linear region is 2.5 m
·cm2 at VGS of 3 V. The drain current density is greater than 1410 A/cm2 at 9 V drain voltage. High-temperature operation of the 4H-SiC VJFETs has also been investigated at temperatures from 25 °C to 225 °C. Changes in the on-resistance with temperature are in the range of 0.90~1.33%/°C at zero gate bias and IDS of 50 mA. The threshold voltage becomes more negative with a negative shift of 0.096~0.105%/°C with increasing temperature.