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CONFERENCE
6/16/2013 - 6/19/2013
The 7th International conference on Physical and Numerical Simulation of Materials Processing
5/16/2013 - 5/19/2013
2nd International Congress on Advanced Materials
4/13/2013 - 4/14/2013
2013 2nd lnternational Conference on lntclligent Materials, Applied Mechanics and Design Science (IMAMD 2013)
more...
Articles by keyword: «
ICP
»
22 papers on 2 pages:
1
[2]
[next]
A CAD Modeling Method of Dental Surface Based on Scanning Data
Published in:
New Trends in Mechatronics and Materials Engineering
(p111)
A Method for the Automatic Registration of Hull Blocks Point Clouds
Published in:
Advanced Manufacturing Technology
(p3089)
A New Close-Form Solution for Initial Registration of ICP
Published in:
Smart Materials and Intelligent Systems
(p287)
Ceramics of the Crusader Period found in Acre: An INAA and ICP Study of the Local Productions and of Some Imports from the Byzantine World
Published in:
Euro Ceramics V
(p1496)
Chlorine History in the Treatment of Flying Ashes from Domestic Wastes by a Transferred Arc
Published in:
Euro Ceramics VII
(p891)
Comparison of Digestion Methods for Analysis of Heavy Metals in MSWI Bottom Ash
Published in:
Advanced Materials and Computer Science
(p1075)
Deep Hole Fabrication Based on ICP Process
Published in:
Micro and Nano Technology
(p293)
Design and Implementation of Maxi-Linear Deviation Search Algorithm Based on Improved ICP
Published in:
Smart Materials and Intelligent Systems
(p293)
Dry Etching and Metallization Schemes in a GaN/SiC Heterojunction Device Process
Published in:
Silicon Carbide and Related Materials - 1999
(p1049)
Effect of Thermal Annealing in NH
3
Ambient on Nanoporous
n
-GaN and Subsequent Epilayer
Published in:
Frontiers of Manufacturing and Design Science
(p3016)
Etching Mechanism of ZnO Thin Films in Inductively Coupled Plasma
Published in:
Advances in Nanomaterials and Processing
(p65)
Hydrogen Incorporation into SiC Using Plasma-Hydrogenation
Published in:
Silicon Carbide and Related Materials 2001
(p569)
Inductively Coupled Plasma Reactive Ion Etching of Ge-SiO
2
and SiON Using C
2
F
6
and NF
3
-Based Gas Mixtures
Published in:
Advances in Nanomaterials and Processing
(p503)
Microstructural Analysis for Si Wafer after CMG Process
Published in:
Advances in Abrasive Technology IX
(p367)
Plasma Etching for the Application to Low-K Dielectrics Devices
Published in:
Research Trends in Contemporary Materials Science
(p113)
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