Papers by Keyword: Line Defect

Abstract: In the structures of all metastable precipitates in Al-Mg-Cu and Al-Mg-Si alloys, we find that column surrounding of an element column in the needle/lath direction order according to simple principles. Advanced transmission electron microscopy and DFT calculations support the principles originate with a line defect, which is a segment of a <100>Al column shifted to interstitial positions. We propose the defect aids solute decomposition by partitioning the FCC matrix locally into columns of fewer and higher number of nearest neighbours, which suit smaller and larger size solute atoms, respectively. The defect explains how <100> directionality of the precipitates can arise in a cluster. Ordering of a few defects leads naturally to GPB zones in Al-Mg-Cu and to β'' in Al-Mg-Si.

Abstract: In order to filter, we use the coupling methods of line defects and point defects in photonic crystals to verity through theories and experimentations, get micro-cavity center frequency and wavelength of the main waveguide frequency resonance, and the same frequency lights will enter micro-cavity. Results show waveguides and micro-cavity can support its modes within in their deficiencies, but defects still can transfer energies through the evanescent coupling, the evanescent coupling is the role of the photonic crystals to the integration of device.

Abstract: This work describes the combination of photolithography and self-assembly methods for fabrication of 3D photonic crystals (PCs) with well-defined micron-scale line defects embedded in the PCs. Line defects with different dimensions, shapes, and compositions have been introduced into the 3D PCs by choosing different photoresists, masks, and template-directed assembly techniques. Infiltration of carbon using high-temperature chemical vapor deposition (CVD) technique showed that the fabrication procedure offers an ideal approach to functional 3D photonic devices from self-assembled photonic crystals.

Abstract: This work describes the combination of photolithography and self-assembly methods for fabrication of 3D photonic crystals (PCs) with well-defined micron-scale line defects embedded in the PCs. Line defects with different dimensions, shapes, and compositions have been introduced into the 3D PCs by choosing different photoresists, masks, and template-directed assembly techniques. Infiltration of carbon using high-temperature chemical vapor deposition (CVD) technique showed that the fabrication procedure offers an ideal approach to functional 3D photonic devices from self-assembled photonic crystals.