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Articles by keyword: «Low Pressure Chemical Vapor Deposition»

• Crystallisation Behaviour of Amorphous Thin Si Films Produced by Low Pressure Chemical Vapor Deposition
  Published in: Polycrystalline Semiconductors III (p293)
• Determination of Crystallisation Parameters of a-Si from In Situ Conductance Measurements and Transmission Electron Microscopy Analysis
  Published in: Polycrystalline Semiconductors III (p311)
• Performance of Poly-Si Thin Film Transistors Fabricated by Excimer-Laser Annealing of SiH₄- and Si₂H₆- Source Low Pressure Vapor Deposited a-Si Films with or without Solid-Phase Crystallization
  Published in: Polycrystalline Semiconductors III (p565)
• Towards Complementary Metal-Oxide-Silicon Thin-Film Devices with a New Structure
  Published in: Polycrystalline Semiconductors VII (p429)