| Paper Title | Page |
|---|---|
|
Asymmetric Interface Densities on n and p Type GaN MOS Capacitors Authors: W. Huang, T. Khan, T. Paul Chow |
1525 |
|
Boron and Phosphorus Implantation Induced Electrically Active Defects in p-Type Silicon Authors: Jayantha Senawiratne, Jeffery S. Cites, James G. Couillard, Johannes Moll, Carlo A. Kosik Williams, Patrick G. Whiting |
313 |
|
Characterization of 4H-SiC MOSFETs with NO-Annealed CVD Oxide Authors: Hiroshi Yano, Tomoaki Hatayama, Yukiharu Uraoka, Takashi Fuyuki |
971 |
|
Characterization of Diverse Gate Oxides on 4H-SiC 3D Trench-MOS Structures Authors: Christian T. Banzhaf, Michael Grieb, Achim Trautmann, Anton J. Bauer, Lothar Frey |
691 |
|
Characterization of Large Area 4H-SiC and 6H-SiC Capacitive Devices at 600 °C Authors: Ruby N. Ghosh, Reza Loloee |
1187 |
|
Characterization of POCl3-Annealed 4H-Sic Mosfets by Charge Pumping Technique Authors: Ai Osawa, Hiroshi Yano, Tomoaki Hatayama, Takashi Fuyuki |
541 |
|
Characterizations of SiC/SiO2 Interface Quality Toward High Power MOSFETs Realization Authors: D. Ziane, Jean Marie Bluet, Gérard Guillot, Phillippe Godignon, Josep Montserrat, R.R Ciechonski, Mikael Syväjärvi, Rositza Yakimova, L. Chen, Philip A. Mawby |
1281 |
|
Critical Reliability Issues for SiC Power MOSFETs Operated at High Temperature Authors: Satoshi Tanimoto, Tatsuhiro Suzuki, Akihiro Hanamura, Masakatsu Hoshi, Toshiro Shinohara, Kazuo Arai |
779 |
|
Deep States in SiO2/p-Type 4H-SiC Interface Authors: Hiroshi Yano, N. Inoue, Tsunenobu Kimoto, Hiroyuki Matsunami |
841 |
|
Authors: Tetsuo Hatakeyama, T. Shimizu, T. Suzuki, Y. Nakabayashi, Hajime Okumura, K. Kimoto |
477 |