Papers by Keyword: Magnetron Sputtering

Abstract: There is an ongoing interest in the research and application of thin film coatings containing titanium oxides and titanium nitrides, due to their properties such as photocatalytic activity, mechanical hardness, biocompatibility, and so on. Reactive sputter deposition is widely used for the production of such coatings. A characteristic of this method is the hysteresis, which leads to an ambiguous dependence of the deposition rate and the coating quality on the process conditions. There are a number of theoretical models describing reactive magnetron sputtering. One of the most advanced is the RSD2013 model. Several parameters in this model can only be determined experimentally. This article focuses on the investigation of the hysteresis during the reactive magnetron sputtering deposition process. The RSD2013 parameters that describe the experimental setup were determined, and on their basis the dependences of the characteristics of the hysteresis region on the discharge power, the type of reactive gas, and the working gas pressure were investigated. Additionally, the growth rate of the thin film coating prepared in various modes was compared with the RSD2013 model, which is in agreement with the experimental data. The results obtained from the RSD2013 model in comparison to the experimentally obtained data make it possible to provide an overview of suitable operating modes for the deposition of titanium dioxide and titanium dioxide for the magnetron sputtering device used.

Abstract: The paper considers phase transformations in the E110 zirconium alloy with multilayer CrN/Cr coatings under linear heating up to 1250 °C with isothermal exposure for 20 min. The multilayer CrN/Cr coatings can decelerate Cr-Zr interdiffusion by formation of a barrier ZrN layer at the “coating-alloy interface” due to CrN decomposition at high temperature. The duration of barrier effect depends on a layer thickness of CrN/Cr multilayers. This effect results in a better corrosion resistance of the E110 alloy with multilayer CrN/Cr coatings under high-temperature oxidation at 1100 °C in air in comparison with Cr-coated E110 alloy.

Abstract: Copper nanofilms are extensively used in the field of material science research. Nanoparticles and nanostructures of copper have various utilities in the field of photocatalytic and sensor applications. The transition metal nanoparticles and nanostructures supply plenty free electrons which drastically enhances the optical and electrical properties compared to bulk material. Here, copper thin films have been deposited on glass slides and silicon substrates using an indigenously developed DC magnetron sputtering system. These depositions have been carried out at three different time spans keeping the magnetron discharge current, working vacuum and target to substrate distance unaltered. The objective of this work is to study the crystalline structure and measure the thickness of the copper nanofilm deposited at three different times. The synthesized films were characterized by using X-Ray Fluorescence (XRF), X-Ray Diffractometer (XRD) and Secondary Ion Mass Spectrometer (SIMS). Characteristic peaks of copper (111) along with Cu₂O (110), (220) and (111) were obtained from the XRD pattern. The average grain size of the deposited films has been calculated using Debye-Scherrer equation. The film thickness ranging from 80-160 nm for various time spans were measured from depth profile analysis using SIMS data.

Abstract: The investigations of (Ti + Al)-SiO₂ surfacing by magnetron deposition are presented in this article. The correlation between film`s thickness deposited on the particles by mechanocomposites and magnetron sputtering time was established. It was determined that the rational time for surfacing by Ti-Al mechanocomposites system is about 40 minutes. According that deposition time the thickness of deposited SiO₂ films were obtained as 5.2 microns.

Abstract: This work describes the study of the effect of thermal annealing on the properties of the ZnO:Ag thin film composites, which are the basis of sensors of heavy metal ions, as well as sensors of poisonous and explosive substances. Changes of the optical properties and morphology of the surfaces of composites with five different component ratios were analyzed. The studies performed have revealed significant changes in the properties of nanocomposites ZnO:Ag. This study may become the basis for future works on improving the sensitivity of sensors of poisonous and explosive substances.

Abstract: Hafnium and Hydrogen co-doped indium oxide films (IHFO:H) were prepared by radio frequency magnetron sputtering technology. The effect of hydrogen-donor dopant on the structural, optical and electrical properties of the films was investigated systematically. The resistivity of the IHFO:H film decreased by 2.4×10^-4 Ω cm and the mobility improved by 8.2 cm²/Vs compared with Hafnium oxide doped indium oxide film. Employing the IHFO:H film as an electrode for a solar cell can improve efficiency.

Abstract: The development of novel light metal alloys represents an important task in the further optimization of technical materials. Multi-component systems with more than 4 metals are very promising to outperform currently existing alloys, but lack significant research in systems not dominated by transition metals to date. In this work, alloys containing the elements Al, Cu, Mg and Zn were produced using magnetron sputter deposition. A detailed structural investigation using electron microscopy provided valuable insights into the influences of different metals and their relative proportions in the alloy on material properties.

Abstract: With the widespread use of film transistors, amorphous oxide thin films have excellent transparency and conductivity, stable performance, smooth and smooth surface, easy to etch and large-area preparation, are compatible with existing processes, and do not require subsequent annealing to simplify the process. Process and other advantages have been applied to many fields such as thin film transistors. The principle of the amorphous oxide is basically the same as that of the crystalline state, Magnetron sputtering technology can prepare super-hard films, corrosion-resistant friction films, superconducting films, magnetic films, optical films, and various films with special functions. It is widely used in the field of industrial film preparation. This article focuses on the principle and characteristics of magnetron sputtering technology for electronic materials, the development history of magnetron sputtering technology and its development trend.

Abstract: In magnetoelectric sensors for the detection of weak magnetic fields, the magnetostrictivecomponent is required to show a high strain at small magnetic field changes. Co-Fe alloys, amongrare earth free materials, have one of the largest saturation magnetostriction and are magnetically softat the same time. In this study, Co-Fe alloy films with 66 at.-% Co are prepared by magnetron sputterdeposition of Co/Fe-multilayers which differ in their individual layer structure and in a subsequentrapid thermal annealing process. The influence of the initial bilayer period and the annealing temperatureon the phase formation and film structure are investigated. X-ray diffraction revealed a higherfraction of the desired face-centered cubic solid solution for thicker individual layers after the 800 °Cannealing. The change of the electrical in-plane resistivity reaches a minimum around 500 °C and iscorrelating well with the observed grain growth and solid solution phase formation. The investigationof magnetic properties with vibrating sample magnetometry shows coercive fields of 3.2 kA/m and2.2 kA/m for fully alloyed films with initial bilayer periods of 25 nm and 250 nm, respectively.

Abstract: In an article, studies of tin dioxide films for challenging sensitive elements of gas sensors for monitoring gaseous impurities in air have been described. The technological influence issues parameters of the process producing of tin dioxide films by magnetron sputtering at a fixed magnetron power on their crystal structure and phase composition were considered. The substrate temperature, layer thickness, and oxygen concentration in the atomized gas were considered as parameters. The foundation for improving the constructive and technological solutions of film gas sensors based on the research results was laid.