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CONFERENCE
6/16/2013 - 6/19/2013
The 7th International conference on Physical and Numerical Simulation of Materials Processing
5/16/2013 - 5/19/2013
2nd International Congress on Advanced Materials
4/13/2013 - 4/14/2013
2013 2nd lnternational Conference on lntclligent Materials, Applied Mechanics and Design Science (IMAMD 2013)
more...
Articles by keyword: «
Megasonic
»
13 papers on 1 page:
1
A Theoretical and Experimental Study of Damage-Free BEOL Cleaning with Megasonic Agitation
Published in:
Ultra Clean Processing of Silicon Surfaces VI
(p151)
Acoustic Field Analysis of a T Type Waveguide in Single Wafer Megasonic Cleaning and its Effect on Particle Removal
Published in:
Ultra Clean Processing of Semiconductor Surfaces VIII
(p229)
Behaviour of a Well-Designed Megasonic Cleaning System
Published in:
Ultra Clean Processing of Silicon Surfaces VII
(p155)
Development of a Megasonic System for Cleaning Flat Panel Display
Published in:
Ultra Clean Processing of Semiconductor Surfaces X
(p181)
Ex Situ Bubble Generation, Enhancing the Particle Removal Rate for Single Wafer Megasonic Cleaning Processes
Published in:
Ultra Clean Processing of Semiconductor Surfaces VIII
(p201)
High Efficiency Single Wafer Cleaning for Wafer Bonding-Based 3D Integration Applications
Published in:
Ultra Clean Processing of Semiconductor Surfaces X
(p269)
High Speed Imaging of 1 MHz Driven Microbubbles in Contact with a Rigid Wall
Published in:
Ultra Clean Processing of Semiconductor Surfaces IX
(p7)
Impacts of Ionization Potentials and Megasonic Dispersion
Published in:
Ultra Clean Processing of Semiconductor Surfaces IX
(p19)
Low Si Recess on Cleaning Process by Dilute HF/SC-1 with Megasonic
Published in:
Ultra Clean Processing of Semiconductor Surfaces VIII
(p209)
Megasonic Sweeping and Silicon Wafer Cleaning
Published in:
Ultra Clean Processing of Semiconductor Surfaces IX
(p27)
Non-Contact Cleaning Process for Post-CMP Copper
Published in:
Ultra Clean Processing of Silicon Surfaces VII
(p291)
Photoresist Characterization and Wet Strip after Low-k Dry Etch
Published in:
Ultra Clean Processing of Semiconductor Surfaces VIII
(p325)
Strength Distribution of Megasonic Damage Events
Published in:
Ultra Clean Processing of Silicon Surfaces VII
(p147)
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