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Articles by keyword: «N₂O»

• Characterization of Nitrided Gate Oxide Formed by RTP for SiC MOSFET Application
  Published in: Advances in Innovative Materials and Applications (p221)
• Effect of Increased Oxide Hole Trap Density due to Nitrogen Incorporation at the SiO₂/SiC Interface on F-N Current Degradation
  Published in: Silicon Carbide and Related Materials 2010 (p382)
• Effect of Post-Oxidation Annealing in Wet O₂ and N₂O Ambient on Thermally Grown SiO₂/4H-SiC Interface for P-Channel MOS Devices
  Published in: Silicon Carbide and Related Materials 2011 (p709)
• High Temperature Rapid Thermal Oxidation and Nitridation of 4H-SiC in Diluted N₂O and NO Ambient
  Published in: Silicon Carbide and Related Materials 2004 (p669)
• Interfacial Properties of SiO₂ Grown on 4H-SiC: Comparison between N₂O and Wet O₂ Oxidation Ambient
  Published in: Silicon Carbide and Related Materials 2005 (p979)
• Inter-Pulse Spectroscopy Based on Room-Temperature Pulsed Quantum-Cascade Laser for N₂O Detection
  Published in: Measuring Technology and Mechatronics Automation IV (p607)
• N₂O Direct Decomposition over Hierarchical FeZSM-5 Catalysts
  Published in: Advances in Environmental Science and Engineering (p2593)
• N₂O Processing Improves the 4H-SiC:SiO₂ Interface
  Published in: Silicon Carbide and Related Materials 2001 (p985)
• Oxidation Process by RTP for 4H-SiC MOSFET Gate Fabrication
  Published in: Silicon Carbide and Related Materials 2010 (p500)
• Oxidation State of Copper Ions in ZSM-5 Zeolite
  Published in: Progress in Advanced Materials and Processes (p83)
• Promotional Effect of Cr on Catalytic Performance of Fe/γ-Al₂O₃ for Ethylbenzene Dehydrogenation in the Presence of N₂O
  Published in: Natural Resources and Sustainable Development (p932)
• Structural Studies of Annealing Effects on Semi-Insulating Polycrystalline Layers Obtained by Using Disilane
  Published in: Polycrystalline Semiconductors IV (p155)