Papers by Keyword: Nano-Spray

Abstract: Structure of amorphous carbon can be composed of sp² (graphite), or sp³ (diamond), or a combination of both, depending on their fractions. Therefore, many researchers were exploring to use it as solar cell material. This research used the amorphous carbon of bio-product as a basic material in the form of palmyra sugar which was synthesized through the heating and doping process to produce n-type and p-type semiconductors. This research aims to analyze the effect of dopant and deposition time on electrical properties. The heating process was carried out at 250°C and the doping process was carried out by adding NH₄OH for a-C:N and H₃BO₃ for a-C:B. The deposition process was carried out by the nano-spray method using a variety of deposition time on the ITO substrate. The result of scanning electron microscopy (SEM) showed that the film thickness increased with the increase of deposition time. Besides, the result of four-point probe (FPP) showed that the dopant can increase electrical conductivity, but the film thickness did not influence it. The electrical conductivity obtained was 5x10^-1 - 6x10^-1 S/cm. And the result of further analysis, it can be concluded that electrical conductivity was still in the range of semiconducting material.

Abstract: In the conventional wet cleaning process of contact holes landing on the Si substrate and WSi metal gate, the ILD BPTEOS bowing and CD enlargement were often found by using dilute HF solution. With the device design rule decreasing, the CD size control and cleaning efficiency enhancement are highly demanded. In this work, the high aspect-ratio contact (AR~10) cleaning in single wafer (SW) tool was demonstrated in 58nm flash device. With the facilitation of nano-spray function to enhance particle removal efficiency (PRE), AM1 cleaning in SW tool can achieve the low contact resistance and tighten Rc distribution with less ILD film damage and lower CD enlargement. The parameter dependency of SW tool, including chemical injection method, nozzle swinging effect and nano-spray function, on contact resistance was also investigated. Compared to AM1 cleaning in bench tool, AM1 process in SW tool performs the larger process window for less ILD film damage at higher temperature and concentration.