Papers by Keyword: Nanosecond Pulse Laser

Abstract: The method of high-energy short pulse laser etching underwater based on thermal - mechanical effect was put forward. In the experiment system with mask and salt solution , heat affected zone was visible decrease and the image of mask was micro-copied at the workpiece surface. Owing to the photochemical reaction and thermal-mechanical coupling effect, uniform line width of 120μm can be obtained.

Abstract: We study some microstructures fabricated by designed 355nm ultraviolet nanosecond pulse laser micromachining system, which consists of LASER, mechanical and optical structure, 3D work platform, and control system. Nanosecond pulse LASER, with 40ns pulse duration, is chosen as the light source. Mechanical and optical structure is designed for laser beam focusing. Computer software resolves the graphics. And control system based on DSP and FPGA is designed to drive the 3D work platform. Raster sensor is used to measure the real distance that the platform moves. Using this system, some experiments are analyzed and some parameters are optimized. Some microstructures are also fabricated on single crystal silicon wafer and organic glass. The lines of fabricated graphics are 20-40um wide and smooth, with less effect of heat.