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Articles by keyword: «Ozone»

• A GAM for Daily Ozone Concentration in Seoul
  Published in: On the Convergence of Bio-, Information-, Enrivonmental-, Energy-, Space- and Nano-Technolgies (p497)
• A Novel Vapor Phase Etching Process for Si
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p239)
• A Process Using Ozonated Water Solutions to Remove Photoresist after Metallization
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p287)
• Advanced Treatment of Textile Wastewater for Reuse by Ozonation-Biological and Membrane Processes
  Published in: Eco-Dyeing, Finishing and Green Chemistry (p578)
• Can we Increase the Effiency of Organic Contamination Removal by Ozone/DI-Water Processes by Using Additives?
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p215)
• Characteristics of SiO₂ Film Grown by Atomic Layer Deposition as the Gate Insulator of Low-Temperature Polysilicon Thin-Film Transistors
  Published in: Advances in Nanomaterials and Processing (p247)
• Characterization of DI Water/O₃ Oxidation of Si (100) and Si (111) Surfaces by OCP Measurements
  Published in: Ultra Clean Processing of Silicon Surfaces V (p161)
• Comparison of HF and Ozone Treated SiC Surfaces
  Published in: Silicon Carbide and Related Materials 2000 (p219)
• Degradation of Hydroquinone by Pulsed Corona Discharge Combined with Ozone Process
  Published in: Progress in Environmental Science and Engineering (p1909)
• Degradation of p-Toluenesulfonic Acid by Ozonation: Performance Optimization and Mechanism
  Published in: Environment Materials and Environment Management (p1551)
• Design of Diseases and Pests Therapeutic Instrument of Solar in Greenhouse
  Published in: Mechanical and Electronics Engineering III (p442)
• Determination of Photoresist Degradation Products in O₃/DI Processing
  Published in: Ultra Clean Processing of Silicon Surfaces V (p207)
• Development of High Voltage High Frequency Resonant Inverter Power Supply for Atmospheric Surface Glow Barrier Discharges
  Published in: PIM & ASIP 2004 (p81)
• Dynamics of Mass Transfer on a Wafer Surface in Ozonated-Water Processing for Photoresist Removal
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p157)
• Effect of Additives on the Removal Efficiency of Photoresist by Ozone/DI-Water Processes: Experimental Study
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p101)