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Articles by keyword: «Photoresist»

• All-Wet Stripping of FEOL Photoresist Using Mixtures of Sulphuric Acid
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p105)
• Determination of Photoresist Degradation Products in O₃/DI Processing
  Published in: Ultra Clean Processing of Silicon Surfaces V (p207)
• Development of New Evaluation Method for Adhesive Strength between Microsized Photoresist and Si Substrate of MEMS Devices
  Published in: The Mechanical Behavior of Materials X (p1185)
• High Temperature SPM Process Study for Stripping of Implanted Photoresist
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p89)
• Impact of Trace Metals in Litho Chemicals
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p279)
• Influence of Photoresist and BARC Selection on the Efficiency of a Post-Etch Wet Strip in BEOL Applications
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p219)
• Modification of Photoresist by UV for Post-Etch Wet Strip Applications
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p323)
• Photolithography and Photochemical Reaction of Copolymer Containing Anthracene in Langmuir-Blodgett Films
  Published in: Materials Processing Technology (p698)
• Photoresist Stripping by Ozone/Water Processes: Effect of Additives
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p309)
• Plasma Etch Residue and Photoresist Removal Utilizing Environmentally Benign Process Chemicals
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p143)
• Plasma Etching for the Application to Low-K Dielectrics Devices
  Published in: Research Trends in Contemporary Materials Science (p113)
• Research on Effect of High Energy Implant to Resist Thickness
  Published in: Frontiers of Manufacturing Science and Measuring Technology (p718)
• Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p277)