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Articles by keyword: «Polishing Pad»

• A New Polishing Pad of EVA-Adhesive-Dressed-with-SiC-Grits Polishing Face and its Applications in Silicon Wafer Polishing
  Published in: Advances in Abrasive Technology XIII (p539)
• A Study of Nano-Polishing of Injection Molds Using a Fixed Abrasive Pad
  Published in: Advances in Abrasive Technology V (p247)
• A Study on the Manufacture of the Next Generation CMP Pad with a Uniform Shape Using the Micro-Molding Method
  Published in: Advances in Abrasive Technology VI (p413)
• Achieving High Flatness of Workpiece Edge Shape by Considering Polishing Pressure
  Published in: Advances in Precision Engineering (p71)
• An Analysis of the Pad Deformation for Improved Planarization
  Published in: Advances in Abrasive Technology V (p241)
• Chemical Mechanical Polishing of Transparent Nd:YAG Ceramics
  Published in: Advances in Machining & Manufacturing Technology IX (p278)
• Dressing Behaviors of PCD Conditioners on CMP Polishing Pads
  Published in: Advances in Abrasive Technology XII (p201)
• Effect of Conditioning Parameters on Surface Non-Uniformity of Polishing Pad in Chemical Mechanical Planarization
  Published in: Advances in Abrasive Technology XI (p498)
• Effect of Dressing Load and Speed on Removal Rate in the Chemical Mechanical Polishing Process
  Published in: Recent Trends in Materials and Mechanical Engineering Materials, Mechatronics and Automation (p832)
• Fabrication of Ultra-Fine Abrasive Polishing Pads by Gel Technique
  Published in: Advances in Materials Manufacturing Science and Technology II (p468)
• Friction Phenomenon in Chemical Mechanical Polishing of Oxide Film
  Published in: Advances in Abrasive Technology XIII (p320)
• Influences of Machining Parameters on Silicon Wafer Polished with Gel-Coupled Ultra-Fine Abrasive Polishing Pads
  Published in: Advances in Grinding and Abrasive Technology XIV (p279)
• Investigation of a Polishing Pad and a Carrier Film for Decreasing Edge Roll Off of Workpiece
  Published in: Advances in Abrasive Technology XIV (p476)
• Investigation of Shear and Thermal Characteristics of Polishing Interface in Soft Pad Polishing Process
  Published in: Recent Trends in Materials and Mechanical Engineering Materials, Mechatronics and Automation (p508)
• Mechanical Mechanisms of Chemical Mechanical Polishing
  Published in: Multi-functional Materials and Structures (p1486)