Articles by keyword: «Polishing Pad»
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Mechanical Mechanisms of Chemical Mechanical Polishing
Published in: Multi-functional Materials and Structures (p1486) -
Modeling of Polishing Pad Wear in Chemical Mechanical Polishing
Published in: Machining and Advanced Manufacturing Technology X (p318) -
Novel Measurement Technique on 3D Surface Topography of Polishing Pad
Published in: Surface Finishing Technology and Surface Engineering (p265) -
Status and Trends of Fixed Abrasive Polishing on Semiconductor
Published in: Anti-Fatigue Design and Manufacturing Technologies I (p390) -
Study of Contact Temperature in Polishing Surfaces
Published in: Manufacturing Process Technology (p1527) -
Study on Groove Shape of CMP Polishing Pad: A Review
Published in: Ultra-Precision Machining Technologies (p278) -
Study on the Surface Characteristics of Polishing Pad Used in Chemical Mechanical Polishing
Published in: Digital Design and Manufacturing Technology (p724) -
Surface Characterization of Silicon Wafers Polished by Three Different Methods
Published in: Advances in Grinding and Abrasive Technology XVI (p233)