Papers by Keyword: RF Sputtering

Abstract: In this study, zinc telluride (ZnTe) thin films were deposited using radio frequency (RF) sputtering at various powers ranging from 100 to 250 W for 60 minutes. Structural and optical properties were investigated as a function of RF power. X-ray diffraction (XRD) analysis revealed that increasing the RF power led to a growth in the crystallite size from 3 to 9.4 nm, while dislocation density and microstrain decreased. The ZnTe films exhibited a cubic crystal structure with a lattice parameter of 6.08 Å. Scanning Electron Microscopy (SEM) showed that the film surfaces are uniform and free of cracks. Optical measurements using UV-Vis-NIR spectrophotometry indicated that both transmittance and optical band gap increased from 1.82 to 1.94 eV with increasing RF power. The modulation of the optical and structural properties of ZnTe thin films by RF power, as demonstrated in this study, opens perspectives for optimizing these materials in real device architectures, particularly for more efficient solar cells or high-performance sensors.

Abstract: Tin oxide thin films were synthesized on FTO substrates by the Radio Frequency sputtering technique in aO₂/Ar mixture atmosphere. X-ray diffraction patterns revealed the formation of tetragonal structure of SnO₂ films, with a crystallite size that increases from 8.3 to 10.3 nm by increasingthe oxygen percentage from 5% to 15%, then decreases again at 30%oxygen. SEM images reveal homogeneous, smooth, non-porous and crack-free surfaces in all films. EDX spectra confirm the increasing O/Sn ratio for high oxygen percentages. Optical transmittance is observed toincrease with increasing the oxygen percentagewith an energyband gap ranging between 3.78 and 3.91 eV. Mott-Schottky characterization shows higher charge carrier concentration in the film synthesized with 10% O₂. This film exhibits, afterwards, the highest efficiency in terms of degradation of in a UV photoreactor.

Abstract: X-ray reflectivity technique is applied in evaluation of deposition of multilayer thin film fabrication process. Amorphous silicon carlbide (SiC) and carbon (rGO) was deposited alternatively on a glass substrate. Via X-ray reflectivity, every layer deposited can be analyzed, thus every flaws in defected layer can be figure out. This paper will explain further throughout the evaluation process. Deposition process carried out by radio frequency (RF) magnetron sputtering of 99% purity of silicon carbide (SiC) and carbon (C) as a target. Implementation of X-ray reflectivity technique had proven in fabricating better quality of thin film.

Abstract: In this work, the cuprous oxide (Cu₂O) thin film on glass substrates were fabricated at low growth temperature by a single-step aqueous solution of chemical bath deposition method. In order to optimize optical and morphology quality, the effect of two different heat treatment methods are conventional furnace annealing process and continuous wave (CW) CO₂ laser annealing technique were investigated. The effect of annealing temperatures on the properties of Cu₂O thin films were systematically investigated by UV-Vis spectrophotometer, X-ray diffraction (XRD), and field emission scanning electron microscopy (FESEM).

Abstract: The deposition of composites with tailored optical properties is investigated. This would employ structures consisting of combined metallic and oxides nature. A thin layer of TiNi is obtained by using RF magnetron sputtering on a stainless-steel substrate, followed by oxidation at 400°C and 800°C for four and one hours, respectively. The optical properties of the thin films were characterized by optical spectrophotometer, and Fourier Transform Infrared Spectroscopy (FTIR). The morphology, topography, and structure were studied by scanning electron microscope (SEM), atomic force microscope (AFM), and X-ray diffraction (XRD). The results show that TiO₂ has been produced through the oxidation process of the sputter-deposited TiNi thin film at high oxidation temperature. The TiNi thin films showed a significant improvement in optical properties after oxidation, as the absorbance increased, and the emittance was reduced. This work introduces oxidized TiNi thin films as candidates for solar selective absorber.

Abstract: In this study, Zinc Oxide (ZnO) microstructures were grown on porous silicon (PS) using chemical bath deposition (CBD) method by varying the growth time. The field emission scanning electron microscopy (FESEM) revealed the morphology and sized of ZnO. The X-ray diffraction (XRD) spectra indicate the high quality growth of ZnO on PS surface. Raman analyses revealed the peaks shift of E₂(High), characterized wurtzite lattice and indicates good crystallinity of ZnO.

Abstract: The synthetic NiO nanostructures have been grown using thermal wet oxidation of metallic Ni thin films on ITO/glass by RF sputtering. The deposited Nickel thin films layer were oxidized in stream atmosphere at varying temperatures range of 400 °C to 700 °C inside furnace. Structural, surface morphology, electrical and the optical properties of NiO nanostructure were analysed by X-ray diffraction (XRD), Field effect scanning electron microscope (FESEM), energy dispersive X-ray (EDX), hall effects measurements and UV-Visible spectroscope measurements. XRD analysis proves that the NiO nanostructure has a cubic structure with orientation of the most intense peak at (200), and the film prepared 600 °C shows a better crystalline quality. FESEM and AFM results also prove that by increasing the oxidation temperature, the dimensions and roughness of the NiO nanoparticle thin layer increases. Also the oxidation rate appears higher. The optimum temperature for synthesizing high quality NiO with great stoichiometric and crystalline property was determined to be at 600 of wet oxidation. EDX results reveals only O and Ni present in the treated samples, indicating a pure NiO composition obtained. From UV-Vis absorption spectroscope of Tauc’s relationship, the bang gap was observed to increase with temperature at range of 3.29 – 4.09 eV. The effect of annealing was highlighted on the tunability of electrical property Ni thin films with both n-type and p-type behavior NiO as determine from hall measurement. The observed tunability of NiO thin film will ease way toward p-n homojunction realization for optoelectronic device applications of short wave length that involves photodetectors and LEDs

Abstract: Silver nanocomposites are of great interest for several fields, ranging from packaging to biomedical applications, because of their known antibacterial properties. However, their use is strongly limited by technological issues: synthesis methods of silver nanoparticles are still difficult to control in terms of size, shape and aggregation. Moreover separation of nanoparticle aggregates should occur during part manufacturing by mixing with the polymer base but this process is also troublesome. In the present study, a new process to fabricate silver nanocomposites with antibacterial properties is presented. Silver nanofilms are deposited by radio frequency (RF) sputtering on polypropylene (PP) substrates. Consequently PP coated substrates are cut and inserted in a small-scale polymer mixer to produce the nanocomposite in a single step, without the need of producing nanoparticles. In fact, nanoparticles originate by the fragmentation of the nanocoating. Microscopic observations of nanocomposites revealed silver nanoclusters of different sizes. Their antibacterial activity has been verified in accordance to ISO 22196. The antibacterial activity of the nanocomposite was detected for the Escherichia coli and Staphylococcus aureus bacteria.

Abstract: Transparent conductive Al-doped zinc oxide (ZnO:Al) films with different sputtering power were prepared on glass substrate using an RF sputtering technique. Two main peaks of the hexagonal wurtzite structure in the (002) and (004) direction were observed in every deposited ZnO:Al film. Intensities of these peaks were increased with the increasing sputtering power. Moreover, the surface roughness tended to increase with increasing sputtering power whereas the electrical resistance decreased with increasing sputtering power. The ZnO:Al film deposited at 150 and 200 W showed maximum optical transmittance of over 80% in the visible wavelength range. All results confirmed that the sputtering power directly affected film thickness because the higher sputtering power gave rise to a higher deposition rate; the surface morphology of the deposited films was dependent on the sputtering power and the optical properties were indirectly affected by the power of the deposition process.

Abstract: —Tungsten Oxide (WO3) thin films were deposited using 99.9% pure tungsten target onto ITO substrate using RF magnetron sputtering in the range oxygen flow rates of 30-50%. The influence of the oxygen flow rate on characteristic of WO3 thin films has been investigated. The transmittance, resistivity, crystallite, roughness, and surface morphology were measured by UV-Vis, 2-point probe, X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM), and Field Emission Scanning Electron Microscopy (FE-SEM) respectively. Experimental result showed that the deposition rate of WO3 thin films decreased by increasing oxygen flow rate. A poor crystalinity or more too amorphous of WO3 thin films produces by using various oxygen content. A higher optical transmittance spectrum detected at 30% oxygen content about 86% at wavelength 550nm. Keywords—Tungsten Oxide (WO3); RF sputtering, sputtering oxygen