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Articles by keyword: «SPM»

• A New Method of Making Grating - Etched by SPM
  Published in: Manufacturing Process Technology (p4077)
• A New Method to Obtain Tip Shape from Images and Reconstruct the Corresponding Image
  Published in: Nanoscience and Technology (p873)
• Accelerated Removal of Photoresist for Semiconductor Production by an Increased-Pressure Ozone and Water Vapor Process
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p227)
• Advances on 45nm SiGe-Compatible NiPt Salicide Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p211)
• AFM and SEM: Competing or Complementary Techniques?
  Published in: Materials Science, Testing and Informatics I (p241)
• An Investigation on the 3D Micromachining Techniques Based on a SPM
  Published in: Advances in Abrasive Technology VI (p465)
• Cleaning after Contact Etching of Multi-Film Stack and Cobalt Disilicide: An XPS Study
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p243)
• Design Research of Nanopositioner Based on SPM and Its Simulation of FEM
  Published in: Nanoscience and Technology (p1473)
• Ferroelectric P(VDF/TrFE) Ultrathin Film for SPM-Based Data Storage Devices
  Published in: Advances in Nanomaterials and Processing (p303)
• Measurement of d₁₅ Shear-Mode Piezoelectric Response in PZT Thin Film
  Published in: Asian Ceramic Science for Electronics III and Electroceramics in Japan XII (p95)
• Object-Oriented Classification of Remote Sensing Image Based on SPM Feature Extraction
  Published in: Information Technology for Manufacturing Systems II (p1997)
• Quantitative Surface Roughness Determination of Materials by AFM: Some Limitations
  Published in: Textures of Materials - ICOTOM 13 (p239)
• Research on Mechanism of Chip Formation at Small Size Cutting
  Published in: Advances in Abrasive Processes (p325)
• Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p277)
• Stripping and Cleaning of High-Dose Ion-Implanted Photoresists Using a Single-Wafer, Single-Chamber Dry/Wet Hybrid System
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p269)