Papers by Keyword: Silicon Oxide Film

Abstract: A transparent hard coating of silicon oxide (SiOx) deposited by using plasma enhanced chemical vapour deposition (PECVD) can protect the surfaces of plastics and metals. This coating has good adhesion, good wear-resistance and environmental resistance. Our work is to optimize this protective organosilicon film in an industry manufacturing process for the metal cover of mobile phones and plastic lenses. Investigation of the failures of the film and analysis of the defect in deposited films by means of the optical microscope and atomic force microscope (AFM) shows that mechanism of the micro defect with Newton color rings.

Abstract: Plasma diagnosis was performed by means of optical emission spectroscopy in the plasma-enhanced chemical vapor deposition process for preparation of hydrocarbon-doped silicon oxide films. The chemical bonding states were characterized by a fourier-transform infrared spectrometer. Based on the results of the diagnosis in organosilane plasma and the chemical bonding states, a reaction model for the formation process of hydrocarbon-doped silicon oxide films was discussed. From the results of optical emission spectroscopy, we found that the oxygen atoms of methoxy groups in TMMOS molecules can be dissociated easily in the plasma and behave as a kind of oxidizing agent. Siloxane bondings in HMDSO, on the other hand, hardly expel oxygen atoms.