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Articles by keyword: «Surface Preparation»

• A Study of FRP–Concrete Bond under Impact
  Published in: Performance, Protection and Strengthening of Structures under Extreme Loading (p630)
• AFM Study of In Situ Etching of 4H and 6H SiC Substrates
  Published in: Silicon Carbide, III-Nitrides and Related Materials (p363)
• Atomic-Step Observations on 6H- and 15R-SiC Polished Surfaces
  Published in: Silicon Carbide and Related Materials 2001 (p729)
• Brazing of AZ31B Magnesium Alloy Sheet
  Published in: THERMEC 2006 (p1603)
• Cleaning of Silicon Surfaces for Nanotechnology
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p77)
• Comparison of Different Surface Pre-Treatments to n-Type 4H-SiC and their Effect on the Specific Contact Resistance of Ni Ohmic Contacts
  Published in: Silicon Carbide and Related Materials 2003 (p833)
• Corrosion Behaviour of some Fe-Base Alloys in H₂-H₂O and H₂-H₂O-HCI Gas Mixtures at 973 K
  Published in: High Temperature Corrosion and Protection of Materials 4 (p591)
• Effect of Surface Preparation and Thermal Anneal on Electrical Characteristics of 4H-SiC Schottky Barrier Diodes
  Published in: Silicon Carbide, III-Nitrides and Related Materials (p929)
• Effect of Surface Preparation on Mechanical Properties of a NiTi Alloy
  Published in: Shape Memory Materials and their Applications (p173)
• Elimination of Debonging of FRP Strips in Shear Strengthened Beams Using Grooving Method
  Published in: Advanced Building Materials (p1077)
• Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p3)
• Factors that Influence the Adherence of Biovitroceramic Coatings on Titanium
  Published in: Materials and Technologies (p217)
• Future Challenges for Cleaning in Advanced Microelectronics
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p1)
• Implementing an In Situ Surface Preparation Prior to Ni Deposition for Ni Salicide Processes
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p19)
• In Situ Etching of 4H-SiC in H₂ with Addition of HCl for Epitaxial CVD Growth
  Published in: Silicon Carbide and Related Materials 2001 (p239)