Papers by Keyword: TiN Film

Abstract: Technological features of obtaining of tin films in a vacuum by liquid-phase target magnetron sputtering were reviewed. With high deposition rate the white color tin coating with amorphous structure is formed on the substrate. X-ray microanalysis of the obtained tin films showed the presence of micro-and nanoparticles of an impurity of the crucible material in the structure of the films. The use of the tantalum crucible with liquid-phase target magnetron sputtering with deposition rate of 3.2 μm / min allows obtaining ultra-pure, continuous, homogeneous tin film on a stationary substrate without impurity material of the crucible.

Abstract: SUS316L, TiN and CrN films were corroded at 500 °C for up to 30 h in 1 atm of (N₂/3.1%H₂O/2.42%H₂S)-mixed gas. SUS316L displayed poor corrosion resistance due to the formation of FeS. It corroded to (Fe, Ni)-mixed sulfides and FeS, forming highly fragile, porous, and nonadherent scales. TiN and CrN films suppressed the sulfidation of SUS316L.

Abstract: To enhance the efficiency of the Multistage depressed collector (MDC) of traveling wave tube amplifiers (TWTs), TiN film was deposited by arc ion plating. The thickness and roughness of the film were respectively measured by scanning electron microscopy (SEM) and atomic force microscopy (AFM). In order to study the effects of the preparation parameters and the process methods of substrates, the orthogonal experimental design method was applied to find out experimental optimum parameters. The analysis of experimental results showed that the film thickness decreased as the bias voltage increased within a certain range. The root mean square (rms) of roughness R_q was the minimum value for TiN film, when the bias voltage was 150V, the maximum value of the secondary electron emission yield (SEEY) reduced from 1.5 to 1.25 at the optimum parameters.

Abstract: TiN and TiAlN films have been coated on the surface of tool materials by various methods for the life-time extension of tool. In this work, for the improvement of hardness and adhesion of coating to SKD61 substrate, radical nitriding (RN) of substrate was carried out at 450°C for 5 hours in ammonia gas pressure of 2.7×10³ Pa. The results showed that TiN and TiAlN coatings were distributed uniformly on the SKD 61 substrate. And the film thickness was up to 4 μm, which showed so high deposition efficiency (~ 66.7 nm/min) of arc ion plating at this typical process condition. For both coatings, the TiN phases could be detected and the (111) was dominant crystallite grown orientation. The AlN crystallite structure could be detected as expected in TiAlN film. The critical load of TiN film (22.36 N) was slightly smaller than that of TiAlN film (23.88 N). With increasing the load during scratch test, the friction coefficient of TiN film rose quickly, but friction coefficient of TiAlN had a little change, even decreased slightly.

Abstract: This paper describes the fabrication, characterization and application of an environment-friendly tin film/gold nanoparticles (Sn/AuNPs) modified gold microelectrode for square wave stripping voltammetric (SWSV) determination of copper, lead and zinc. The microelectrode chips were fabricated by Micro Electro-Mechanical System (MEMS) technique. The sensitivity of the modified microelectrode was largely improved due to the large surface area of AuNPs and the formation of alloys between target metals and Sn. The influence of hydrogen overflow was reduced and the current response was enhanced because AuNPs made the stripping potential shift positively and Sn extended the stripping potential range. Combining AuNPs with Sn, the obtained microelectrode exhibited satisfied linearity ranges from 5 to 500 μg L-1 for copper and lead, from 10 to 500 μg L-1 for zinc, with a limit of detection of 2 μg L-1 for copper, 3 μg L-1 for lead and 5 μg L-1 for zinc. The Sn/AuNPs/gold microelectrode was successfully applied for simultaneous detection of copper, lead and zinc in tap water sample.

Abstract: Depositing TiN Film on the surface of 4Cr5MoSiV1 with multi-arc ion plating technology method. And 350°C, 450°C, 550°C and 650 °C short oxidation test and 550 °C cyclic oxidation test. By scanning electron microscopy (SEM) and electron spectrometry (EDS) to analysis micro-structure and phase structure of test samples, study TiN film on oxidation resistance, and utilize indentation method to measure mechanical properties. Results show: In a short time under oxidizing conditions, at 550 °C the TiN film still has a good oxidation resistance. The film still have a sufficient bonding strength below 600 °C.

Abstract: Bonding strength of the interface of film-substratum is an important factor and key problem that influence the reliability and usage of film-substratum system. The new technology of pulsed-laser shock detection method which analyzes the mechanism and mathematical model of film separation under the action of pulsed-laser shock,. With the example of measuring the adhesion strength of TiN/SKD11 film system, the surface was respectively impacted with pulsed-laser at the range of 650~1000mJ. To observe the surface topography of Impact points by scanning electron microscope, and to identify TiN film failure threshold by the reflected signal detection. By analyzing the experimental result, it was suggested that film/substrate interfacial adhesion strength was 4.954GW/cm2.

Abstract: TiN film deposited by mid frequency reactive magnetron sputtering process on aluminium alloys surface,which can improved the color of aluminium alloys.Use International Commission on Illumination(CIE) 1976(L*、a*、b*) to calibrate the film color,and use the photoelectric spectrocolorimeter of CM-2600d to research the influence of nitrogen flow rate, sputtering time to the film color.The results show that,TiN thin film color will be change from light yellow, yellow, golden yellow to deep yellow with the nitrogen flow rate and the sputtering time increased.When the nitrogen flow rate reach 18sccm and the sputtering time reach 15min,the color parameter will be L*= 83,a*= 2,b*= 30. At this point, the film thickness is 70nm,TiN thin films have golden yellow color, which have the excellent mechanical characteristic.

Abstract: The ABAQUS software was used to analyze the residual stress of TiN film treated by the single point micro-scale laser shock peening (μLSP). In view of the multi-factor effect of μLSP, the response surface methodology (RSM) of Design-Expert software was utilized to analyze the influence of laser process parameters on the residual stress in TiN film, based on the Box-Behnken experimental design methods, as a result, optimal combination of the laser process parameters was obtained. The results showed that μLSP can transform the tensile residual stress in the TiN film into the compressive residual stress, the compressive residual stress was gradually increasing with the increased laser power density, when the laser power density was 8 GW/cm2, the maximum compressive residual stress of the film surface was up to -350.48 MPa. In addition, as the laser power density increased, the maximum compressive residual stress was moving away from the spot center. The optimal combination of the laser process parameters of μLSP was obtained by the RSM, the laser power density was 7.6 GW/cm2, laser spot diameter was 283 μm, and the number of shocking was 2 times. Simulation results of the average residual stress was -248.76 MPa, while the predicting result of regression model was -245.31 MPa, the error was just 1.38 %. The results showed that μLSP was feasible for improving the residual stress distribution of TiN film, and the RSM can effectively optimize the process parameters of μLSP.

Abstract: Titanium Nitride (TiN) coatings with high surface hardness, good wear and corrosion resistance, low friction coefficient have been widely used in many applications such as a hard coating of cutting tool, a diffusion barrier layer. In this work, TiN thin films were deposited by D.C. magnetron sputtering process on SUS 304 steel substrate. Magnetron sputtering provides a wide variation of the deposition parameters which affect the morphology of the films and, consequently, their properties. The effects of substrate temperature on the microstructure and corrosion resistance of TiN films were studied in details using atomic force microscopy and potentiostat test. Considerable improvements in the surface roughness and corrosion resistance were observed when the substrate temperature was increased from C to C.