Papers by Keyword: TiO₂ Nanofilm Materials

Abstract: Highly conductive and transparent TiO2 nano films have been deposited by R.F. magnetron sputtering method on glass substrates. The influence of argon gas pressure on deposition rate, electrical performance and surface morphology has been studied through the ellipsometric thickness gauge, scanning electron microscopy and energy disperse spectroscopy. The results show that, with the rise of argon gas pressure, the deposition rate reduces, resistivity decreases, roughness increases. When Ar pressure is 3.0Pa, the resistivity reached 3.3×105Ω•cm, sputtering pressure is lower, the surface atomic diffusion capacity is stronger, the film is more dence.

Abstract: TiO₂ thin films with good performance have been prepared by R.F. magnetron sputtering method on glass substrates. Surface morphology and UV absorption spectrum have been studied by XRD, SEM and UV-Vis scanning spectrophotometer. The influence of annealing temperature has also been discussed. The results show that, the films without annealing process present amorphous structure, the defects density of interior fiber is high and the structure is loose. With the rise of annealing temperature, the grain size increases, porosity decreases, and compactness is enhanced, at the same time, the film turns from anatase phase to rutile phase, quantum size effect is significant, surface energy reduces and absorb edge has red shift.