Papers by Keyword: Vacuum Directional Solidification

Abstract: We used high-purity multicrystalline silicon prepared by metallurgical method for the study of directional solidification. The optical microscope was used to observe the etch pits on the surface of silicon wafers, and we calculated their dislocation density. The result showed the space distribution of dislocation density presented “V” shape for each ingot produced at different drop-down rates. The dislocation density of slicon ingots followed the order 10<20<30<40μm/s. The high-resolution glow discharge mass spectroscopy was used to analyze the concentration of transition metal impurities. The macro-morphology of vertical-section of silicon ingots growth at different drop-down rates was observed. The x-ray diffraction measurement was performed to analyze the crystallographic orientations of the silicon ingot growth at 20μm/s, which was a better drop-down rate for producing high-quality multicrystalline silicon.

Abstract: The pot material of Sb-doped n-type mono-crystal silicon was purified by our selfassembled vacuum directional solidification furnace. In the experimental, the pulling rate was 7μm/s, 10μm/s, 20μm/s, 30μm/s and 40μm/s, respectively. The experimental concentration of Sb, Al and Fe at 0.3 proportion of silicon ingot bottom to the top is detected and the theoretical concentration is calculated. The experimental results show that the pulling rate causes a great effect to concentration of Sb and a small effect to concentration of Fe. At the same time, the theoretical distribution concentration and experimental distribution concentration were compared. The experimental route provided a promising idea for complex utilization of the pot material.