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Articles by keyword: «Wet Etching»

• Magnetoresistive Switch Effect and Its Application to Magnetic Field Sensors
  Published in: PRICM-5 (p2223)
• Maskless Fabrication of a Hyperfine Silicon Stamper and Its Application to the PDMS Rheology Casting Process
  Published in: Advances in Engineering Plasticity and Its Applications (p445)
• Materials and Fabrication Issues of Micro V-Groove for Optoelectronics Packaging
  Published in: Manufacturing Science and Technology (p1330)
• Microfabrication of Thermoelectric Hydrogen Sensor Using KOH Solution Etching
  Published in: Electroceramics in Japan VIII (p273)
• Microfabrication Process for XYZ Stage-Needle Assembly for Cellular Delivery and Surgery
  Published in: Advanced Materials and Nanotechnology (p195)
• New Advances in Forming Functional Ceramics for Micro Devices
  Published in: 11th International Ceramics Congress (p2440)
• Open Circuit Potential Analysis as a Fast Screening Method for the Quality of High-k Dielectric Layers
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p7)
• Preparation of Piezoelectric Thick Film Actuator by Screen Printing and Wet Etching
  Published in: Electroceramics in Japan VIII (p45)
• Realization of Silicon Nitride Template for Nanoimprint: A First Result
  Published in: Nanoscience and Technology (p669)
• Solar Cell Fabrication by Wet Etching Combined with Ultrasonic Vibration for Multicrystalline Silicon
  Published in: Optical, Electronic Materials and Applications (p596)
• Solar Cell Surface Texturing Combined Wet Etching and Ultrasonic Vibration
  Published in: Advances in Engineering Design and Optimization (p1210)
• Sources of Hydrogen in III-V Device Processing
  Published in: Hydrogen in Compound Semiconductors (p141)
• Study on Lapping and Constant-Pressure Grinding of Single-Crystal SiC
  Published in: Advances in Abrasive Technology XII (p282)
• Surface Structure of Electrochemically Etched α-SiC Substrates
  Published in: Silicon Carbide and Related Materials - 2002 (p717)
• Wet Oxide Etching of Dual Gate Oxide for 0.13μm Technologies and Beyond: Interaction with Photoresist and Equipment
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p85)