Structural Changes of UHV Deposited Titanium Thin Films in Presence of Oxygen Flow and Temperature

Abstract:

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Ti films of same thickness, and near normal deposition angle, and same deposition rate were deposited on glass substrates, at room temperature, under UHV conditions. Different annealing temperatures as 393K, 493K and 593K with uniform 8 cm3/sec, oxygen flow, were used for producing titanium oxide layers. Their nanostructures were determined by AFM and XRD methods. Roughness of the films changed due to annealing process. The gettering property of Ti and annealing temperature can play an important role in the nanostructure of the films.

Info:

Periodical:

Edited by:

Wu Fan

Pages:

1094-1098

DOI:

10.4028/www.scientific.net/AMM.110-116.1094

Citation:

H. Kangarlou et al., "Structural Changes of UHV Deposited Titanium Thin Films in Presence of Oxygen Flow and Temperature", Applied Mechanics and Materials, Vols. 110-116, pp. 1094-1098, 2012

Online since:

October 2011

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Price:

$35.00

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