Research of Micro-Stereolithography System with Dynamic Pattern Generator


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In order to fabricate micro/meso structures, a novel micro-stereolithography (SL) system with dynamic pattern generator using digital micro-mirror device (DMD) has been investigated. The micro-stereolithography system solidifies photo-sensitive resin with image mask generated by dynamic pattern generator. The micro-stereolithography system is made up of dynamic pattern generator, recoating system and control system. The dynamic pattern generator consists of parabolic concentrator, UV lamp, collimating lens, shutter, DMD and its control, lens and computer. UV light intensity distribution in the imaging plane is investigated. Uniformity UV light intensity distribution is obtained in the imaging plane with changing small area’s gray-scale, and the difference between maximum and minimum value of UV light intensity is 0.4µW/cm2. Small size parts with intricate microstructures have been fabricated with the novel SL system. Compared with laser scanning SL system, the advantage of the novel micro-SL system is that the new SL system can build small objects having micro-structures with low cost in shorter time. The novel micro-SL system provides a solution to the problem that has hampered the progress of SL process into high resolution with low cost.



Edited by:

Kai Cheng, Yongxian Liu, Xipeng Xu and Hualong Xie






G. S. Xu et al., "Research of Micro-Stereolithography System with Dynamic Pattern Generator", Applied Mechanics and Materials, Vols. 16-19, pp. 675-679, 2009

Online since:

October 2009




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