Effect of GaN Cap Layer on the Electrical Properties of AlGaN/GaN HEMT

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The electrical properties of AlGaN/GaN heterojunction high electron mobility transistor (HEMT) are simulated by using sentaurus software. This paper compares two structures, the HEMT with GaN cap layer and the HEMT without GaN cap layer. The sentaurus software simulates the DC and AC characteristics of the two AlGaN/GaN HEMT structures. The HEMT with GaN cap layer can increase the maximum transconductance gm from 177ms/mm to 399ms/mm when the doping concentration of the cap layer is 3×1018cm-3 compared with the other structure under the same conditions. The simulation results indicate that the HEMT with cap layer can increase maximum transconductance gm, saturation current Ids, current-gain cutoff frequency fT, maximum oscillation frequency fmax and reduce the series resistance of the drain to source compared with the HEMT without GaN cap layer. The large Ids of the HEMT with cap layer is attributed to the increase of the concentration of two dimensional electron gas (2DEG). Moreover, the change of the doping concentration of the cap layer will affect the gm and Ids.

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Edited by:

Xianghua Liu, Zhenhua Bai, Yuanhua Shuang, Cunlong Zhou and Jian Shao

Pages:

2393-2396

Citation:

H. Guo et al., "Effect of GaN Cap Layer on the Electrical Properties of AlGaN/GaN HEMT", Applied Mechanics and Materials, Vols. 217-219, pp. 2393-2396, 2012

Online since:

November 2012

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$41.00

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