Analysis of a 3-DOF Rotationally Symmetric Hinge


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Flexure hinges have been widely used as mechanisms for high precision positioning stages that have a micrometer or nanometer resolution. This paper describes the analysis of a 3-DOF rotationally symmetric hinge for the vertical mask aligner stage. The vertical mask aligner stage was designed to overcome the bending of masks by gravity. In order to align the mask and the wafer, the vertical mask aligner stage has one linear motion and yaw rotating motions (Z, Θx, Θy). The new vertical mask aligner stage will try to use rotationally symmetric hinges. These rotationally symmetric hinges would act as guide mechanisms. However, the exact 6-DOF stiffness analysis of the rotationally symmetric hinge did not use these hinges as guide mechanisms. Therefore, this paper focuses on the stiffness analysis of the rotationally symmetric hinges.



Edited by:

Wen-Hsiang Hsieh






H. Y. Kim et al., "Analysis of a 3-DOF Rotationally Symmetric Hinge", Applied Mechanics and Materials, Vols. 284-287, pp. 597-600, 2013

Online since:

January 2013




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DOI: 10.1201/9781420040272

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