Manufacturing Technology of the Sensitive Elements for Gas Sensors Based on Dielectric Membrane Structures

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The new fabrication method of dielectric membrane structures for sensitive elements of gas sensors, based on the separation of anisotropic etching of silicon into two stages, is proposed. The preference etchant compositions, the preference elemental composition of membrane films and the acceptable thickness of the thermal silicon oxide underlay to obtain mechanically relaxed membranes are presented. The group technology for manufacturing of sensitive elements for gas sensors is developed, membrane structures are fabricated and their properties are studied.

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Edited by:

Guanghsu Chang, Jieh-Shian Young and Wirachman Wisnoe

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919-922

Citation:

D.S. Veselov and Y.A. Voronov, "Manufacturing Technology of the Sensitive Elements for Gas Sensors Based on Dielectric Membrane Structures", Applied Mechanics and Materials, Vols. 799-800, pp. 919-922, 2015

Online since:

October 2015

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