Influence of the Electrodeposited Co-Fe Alloys’ Characteristics on their Magnetic Properties

Abstract:

Article Preview

Nanocrystalline CoFe films were fabricated by electrodeposition process for an investigation of the relationship between the alloys’ characteristics and their magnetic properties. The study shows that coating thickness promotes softer magnetic properties of the films, and induces changes of film roughness, preferred orientation and domain pattern. The preferred orientation of the ~1 μm films (thin films) is (110) plane, whereas that of the ~3 μm films (thick films) are (110) and (200) planes. The magnetic domain of the thin films exhibit a stripe-liked pattern, whereas a bubble-liked pattern appears in the thick films. Iron content significantly affects the magnetic properties of the thick films. In this study, the 57.3wt.%Fe thick film has the highest saturation magnetization, and the 80.0wt.%Fe thick film shows the lowest coercivity.

Info:

Periodical:

Advanced Materials Research (Volumes 1025-1026)

Edited by:

H.M. Song, J.W. Hu and H.K. Son

Pages:

709-716

Citation:

T. Chotibhawaris et al., "Influence of the Electrodeposited Co-Fe Alloys’ Characteristics on their Magnetic Properties", Advanced Materials Research, Vols. 1025-1026, pp. 709-716, 2014

Online since:

September 2014

Export:

Price:

$38.00

* - Corresponding Author

[1] T. M. Shvets, L. Yu. Ivanova, Z. M. Mel'nichenko, É. G. Mishchenko and É.M. Natanson: Soviet Powder Metallurgy and Metal Ceramics Vol. 11 (1972), p.572.

[2] T. Osaka, T. Asahi, J. Kawaji and T. Yokoshima: Electrochimica Acta Vol. 50 (2005), p.4576.

[3] B.Y. Yoo, S.C. Hernandez, D.Y. Park and N.V. Myung: Electrochimica Acta Vol. 51 (2006), p.6346.

[4] T. Osaka: Electrochimica Acta Vol. 47 (2001), p.23.

[5] T. Osaka: Electrochemica Acta Vol. 44 (1999), p.3885.

[6] X.Y. Qin, J.G. Kim and J.S. Lee: NanoStructured Materials Vol. 11 (1999), p.259.

[7] B. Zong, G. Han, J. Qiu, Z. Guo, L. Wang, W.K. Yeo and B. Liu: Research Letters in Physical Chemistry Vol. 2008 (2008), p.1.

[8] D.Y. Park, B.Y. Yoo, S. Kelcher and N.V. Myung: Electrochimica Acta Vol. 51 (2006), p.2523.

[9] D.Y. Park, D. Kim, B.Y. Yoo, P.T.A. Sumodjo and N.V. Myung: Electrochimica Acta Vol. 48 (2003), p.819.

[10] T.G. Nieh, C.A. Schuh and H. Iwasaki: Acta Materialia Vol. 51 (2003), p.431.

[11] C.D. Graham and B.D. Cullity: Introduction to magnetic materials, A John Wiley & Sons (2009).

[12] J.B. Yi, X.P. Li, J. Ding and H.L. Seet: Journal of Alloys and Compounds Vol. 428 (2007), p.230.

[13] R. H. Kodama: Magnetism and Magnetic Materials Vol. 200 (1999), p.459.

[14] S. Basu, R.H. Yu, Y. Zhang, A. Parvizi-Majidi and J.Q. Xiao: J. Appl. Physi. Vol. 85 (1999), p.5.

[15] R.C. O'Handley: Modern Magnetic Materials, Principle and Applications, John Wiley & Sons, (2000).

[16] M. A. Willard, M. E. McHenry, H. Iwanabe, R. A. Sutton, Z. Turgut, A. Hsiao and D. E. Laughlin: Bull. Mater. Sci. Vol. 22 (1999), p.495.

[17] D.E. Laughlin and M.E. McHenry: Acta Materialia Vol. 48 (2000), p.223.

[18] M. Georgieva, M. Vopsaroiu, P.J. Grundy, G.V. Fernandez, S. Manzoor, M.J. Thwaites and K. O'Grady: 49th MMM Conference (2004), p.1.

[19] Y.P. Zhao, R.M. Gamache, G.C. Wang, T.M. Lu, G. Palasantzas and J. Th. M. De Hosson: J. Appl. Phys. Vol. 89 (2001), p.1325.

[20] S.R. Femando and M.F. Rhen: Applied Physics Vol. 103 (2008), p.1.

[21] H. Wang, W.Q. Li, S.P. Wong, W.Y. Cheung, N. Ke and J.B. Xu: Materials Characterization Vol. 48 (2002), p.153.

[22] T. Watanabe: Nano-Plating Microstructure Control Theory of Plated Film and Data Base of Plated Film Microstructure, Elsevier (2004).

DOI: https://doi.org/10.1016/b978-008044375-1/50010-5

[23] N. Suliţanu and F. Brı̂nză: Sensors and Actuators A: Physical Vol. 106 (2003), p.212.

[24] S. Tumanski: Handbook of Magnetic Measurements, CRC Press (2011).

[25] T. Osaka: Electrochimica Acta Vol. 45 (2000), p.3311.

[26] T. Osaka, T. Yokoshima, D. Shiga, K. Imai and K. Takashima: Electrochemical and Solid-State Letters Vol. 6 (2003), p. C53.

DOI: https://doi.org/10.1149/1.1554291

[27] N.V. Myung, D.Y. Park, D.E. Urgiles and T. George: Electrochimica Acta Vol. 49 (2004), p.4397.

[28] C. Qiang, J. Xu, S. Xiao, Y. Jiao, Z. Zhang, Y. Liu, L. Tian and Z. Zhou: Applied Surface Science Vol. 257 (2010), p.1371.

[29] J. Kirschner and J. Shen: Appl. Surf. Sci. Vol. 550 (2002), p.300.

[30] C.H. Lai, S.A. Chen and J.C.A. Huang: Journal Applied Physics Vol. 8 (2000), p.6656.

[31] G. Zangari and Y.D. Gamburg: Theory and Practice of Metal Electrodeposition, Springer (2011).

[32] L. Kraus, O. Chayka, Z. Frait and M. Vázquez: IEEE TRANSACTIONS ON MAGNETICS Vol. 48 (2012), p.1348.

Fetching data from Crossref.
This may take some time to load.