Water Desorption from Magnesium Oxide Films Fabricated by Chemical Vapor Deposition

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Magnesium oxide (MgO) films are utilized for the anti-plasma sputtering coating with excellent ability of secondary electron emission in plasma display panels (PDP). These properties are degraded by the impurities adsorbed on the film surface. Therefore, we should obtain impurity-free surface during the PDP manufacturing process. We have synthesized whisker and continuous film types of metal oxide using a chemical vapor deposition (CVD) method operated under atmosphere. In this study, a temperature programmed desorption method has been applied to detect residual species adsorbed on the surface of the present films in the ultra-high vacuum atmosphere. The amount of water adsorption was determined by this method.

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Periodical:

Advanced Materials Research (Volumes 11-12)

Main Theme:

Edited by:

Masayuki Nogami, Riguang Jin, Toshihiro Kasuga and Wantai Yang

Pages:

693-696

DOI:

10.4028/www.scientific.net/AMR.11-12.693

Citation:

S. Kawaguchi et al., "Water Desorption from Magnesium Oxide Films Fabricated by Chemical Vapor Deposition", Advanced Materials Research, Vols. 11-12, pp. 693-696, 2006

Online since:

February 2006

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$35.00

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[16] [10] [4] [0] [30] 130 230 330 430 Sample temp. (�) 530.

[14] [8] [2] [12] [6] Fig. 4. TPD spectra obtained from MgO film synthesized by CVD method. Fig. 3. SEM images of MgO films (a) film surface and (b) cross section.

[1] � �1 � � (a)(a) (b)(b).

[1] µµµµm 1 µµµµm1 µµµµm.

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