Study on Optimization of CMP Slurry for Tantalum in ULSI Based on Taguchi Method

Abstract:

Article Preview

Chemical mechanical polishing (CMP) has become an essential technique in advanced ULSI process. The mechanism of Ta CMP is discussed in this paper. According to the physical and chemical properties of Ta, the alkaline polishing slurry and proper process parameters for Ta CMP are prepared. The paper optimized four key parameters-abrasive concentration, organic alkali, oxidant and surfactant concentration, obtained the comprehensive optimized slurry used in evaluating the removal rate using Taguchi method. The results indicate that: abrasive concentration is 10%, the organic alkali concentration is 15ml/L, the oxidant concentration is 10ml/L and the surfactant concentration is 10ml/L, higher removal rate can be obtained.

Info:

Periodical:

Advanced Materials Research (Volumes 129-131)

Edited by:

Xie Yi and Li Mi

Pages:

794-798

DOI:

10.4028/www.scientific.net/AMR.129-131.794

Citation:

H. L. Mu et al., "Study on Optimization of CMP Slurry for Tantalum in ULSI Based on Taguchi Method", Advanced Materials Research, Vols. 129-131, pp. 794-798, 2010

Online since:

August 2010

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.