Investigation on the Structure and Properties of TiAlN Coatings Deposited by DC Reactive Magnetron Sputtering

Abstract:

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TiAlN coatings have been deposited by reactive magnetron sputtering from TiAl alloy target using a direct current (DC) power source. The crystal structure, chemical composition, surface morphology and hardness of TiAlN coatings which were prepared at various N2 flow rates have been systemically investigated. The results show a strong effect of N2 flow rates on the orientation, grain size and densification in TiAlN coatings. The TiAlN coating shows the highest hardness at a certain N2 flow rate when it has the most compact structure.

Info:

Periodical:

Advanced Materials Research (Volumes 154-155)

Edited by:

Zhengyi Jiang, Xianghua Liu and Jinglong Bu

Pages:

1639-1642

DOI:

10.4028/www.scientific.net/AMR.154-155.1639

Citation:

X. Wang et al., "Investigation on the Structure and Properties of TiAlN Coatings Deposited by DC Reactive Magnetron Sputtering", Advanced Materials Research, Vols. 154-155, pp. 1639-1642, 2011

Online since:

October 2010

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Price:

$35.00

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